Nanoscale surface dynamics of RF-magnetron sputtered CrCoCuFeNi high entropy alloy thin films

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081723%3A_____%2F22%3A00563270" target="_blank" >RIV/68081723:_____/22:00563270 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/00216305:26220/22:PU145900

Výsledek na webu

<a href="https://www.sciencedirect.com/science/article/pii/S2352492822013642?via%3Dihub" target="_blank" >https://www.sciencedirect.com/science/article/pii/S2352492822013642?via%3Dihub</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.mtcomm.2022.104523" target="_blank" >10.1016/j.mtcomm.2022.104523</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Nanoscale surface dynamics of RF-magnetron sputtered CrCoCuFeNi high entropy alloy thin films

Popis výsledku v původním jazyce

High entropy alloy (HEA) thin films of CrCoCuFeNi are grown on stainless steel substrate using radiofrequency (RF) magnetron sputtering method at different sputtering times (30, 60 and 90 min), substrate temperatures (room temperature, 100 and 200 deg. Celsius) and RF powers (100, 150 and 200 W). The nanoscale morphology and topography of the thin films are obtained using an atomic force microscopy (AFM) method. The average surface roughness, interface width, fractal and multifractal characteristics of the films are presented. It is shown that the average surface roughness and interface width decrease with the time of deposition while considering the combination of the other factors. The autocorrelation and height-height correlation functions reveal that these surfaces are self-affine and exhibit fractal characteristics. The increase in sputtering power, with different combinations of time and temperature, is related to large fractal dimension and small lacunarity coefficient. The increase in substrate temperature (for different combinations with time and RF power) is shown to enhance the spatial roughness of the HEA thin films. A multifractal analysis undertaken using generalized fractal dimension, mass exponent against moment order and multifractal spectrum reveal that all the films have a multifractal character, and the films deposited at high temperatures and powers exhibit the strongest multifractal behaviour.

Název v anglickém jazyce

Nanoscale surface dynamics of RF-magnetron sputtered CrCoCuFeNi high entropy alloy thin films

Popis výsledku anglicky

High entropy alloy (HEA) thin films of CrCoCuFeNi are grown on stainless steel substrate using radiofrequency (RF) magnetron sputtering method at different sputtering times (30, 60 and 90 min), substrate temperatures (room temperature, 100 and 200 deg. Celsius) and RF powers (100, 150 and 200 W). The nanoscale morphology and topography of the thin films are obtained using an atomic force microscopy (AFM) method. The average surface roughness, interface width, fractal and multifractal characteristics of the films are presented. It is shown that the average surface roughness and interface width decrease with the time of deposition while considering the combination of the other factors. The autocorrelation and height-height correlation functions reveal that these surfaces are self-affine and exhibit fractal characteristics. The increase in sputtering power, with different combinations of time and temperature, is related to large fractal dimension and small lacunarity coefficient. The increase in substrate temperature (for different combinations with time and RF power) is shown to enhance the spatial roughness of the HEA thin films. A multifractal analysis undertaken using generalized fractal dimension, mass exponent against moment order and multifractal spectrum reveal that all the films have a multifractal character, and the films deposited at high temperatures and powers exhibit the strongest multifractal behaviour.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/LM2018110" target="_blank" >LM2018110: Výzkumná infrastruktura CzechNanoLab</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2022

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Materials Today Communications

ISSN

2352-4928

e-ISSN

2352-4928

Svazek periodika

33

Číslo periodika v rámci svazku

DEC

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

9

Strana od-do

104523

Kód UT WoS článku

000867516000005

EID výsledku v databázi Scopus

2-s2.0-85138478357