RBS and XPS Measurements of Ag and Er Implantation into the Silica Glass

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F44555601%3A13440%2F09%3A00004905" target="_blank" >RIV/44555601:13440/09:00004905 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

RBS and XPS Measurements of Ag and Er Implantation into the Silica Glass

Popis výsledku v původním jazyce

Metal particle implantation into glasses has promising properties for application in optical devices. These properties depend on the size, shape, density and spatial distribution of metal particles [1]. Heavy-ion implantation of silica glasses is an efficient method of fabrication of the metal-nanoparticles composites that are promising for ultra-fast optical devices [2]. Implantation of Ag and Er ions into silicate glass was studied in this work. The energies of the implanted Ag and Er ions were 330 keV and used implantation fluence of ions was 1.0 x 1016 ions.cm-2. The depth distribution and diffusion profiles of implanted Ag and Er were investigated using X-ray photoelectron spectroscopy (XPS) and the Rutherford Backscattering Spectrometry (RBS) with the 2.0 MeV He+ ions, the incoming angle was 0° while the scattering angle was 170°. XPS depth profiles of the different elements were carried out by cycles of Ar+ sputtering at energy of 2.5 keV. Owing to surface charging, samples show

Název v anglickém jazyce

RBS and XPS Measurements of Ag and Er Implantation into the Silica Glass

Popis výsledku anglicky

Metal particle implantation into glasses has promising properties for application in optical devices. These properties depend on the size, shape, density and spatial distribution of metal particles [1]. Heavy-ion implantation of silica glasses is an efficient method of fabrication of the metal-nanoparticles composites that are promising for ultra-fast optical devices [2]. Implantation of Ag and Er ions into silicate glass was studied in this work. The energies of the implanted Ag and Er ions were 330 keV and used implantation fluence of ions was 1.0 x 1016 ions.cm-2. The depth distribution and diffusion profiles of implanted Ag and Er were investigated using X-ray photoelectron spectroscopy (XPS) and the Rutherford Backscattering Spectrometry (RBS) with the 2.0 MeV He+ ions, the incoming angle was 0° while the scattering angle was 170°. XPS depth profiles of the different elements were carried out by cycles of Ar+ sputtering at energy of 2.5 keV. Owing to surface charging, samples show

Druh

D - Stať ve sborníku

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

<a href="/cs/project/LC06041" target="_blank" >LC06041: Příprava, modifikace a charakterizace materiálů energetickým zářením</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2009

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

Book of Contributed Papers of 17th Symposium on Application of Plasma Processe - Visegrad Workshop on Research of Plasma Physics,

ISBN

978-80-89186-46-4

ISSN

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e-ISSN

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Počet stran výsledku

2

Strana od-do

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Název nakladatele

Comenius University in Bratislava; Humboldt-Club Slovakia, Bratislava

Místo vydání

Bratislava, Slovakia

Místo konání akce

Liptovský Ján, Slovakia

Datum konání akce

17. 1. 2009

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

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