Overview of optical properties of Al2O3 films prepared by various techniques

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F12%3A43915253" target="_blank" >RIV/49777513:23520/12:43915253 - isvavai.cz</a>

Výsledek na webu

<a href="http://www.sciencedirect.com/science/article/pii/S004060901200404X" target="_blank" >http://www.sciencedirect.com/science/article/pii/S004060901200404X</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.tsf.2012.03.113" target="_blank" >10.1016/j.tsf.2012.03.113</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Overview of optical properties of Al2O3 films prepared by various techniques

Popis výsledku v původním jazyce

We study optical properties of Al2O3 films prepared by various techniques using spectroscopic ellipsometry. The film preparation techniques include conventional pulsed magnetron sputtering in various gas mixtures, high power impulse magnetron sputtering,annealing of as-deposited Al2O3 in an inert atmosphere and annealing of as-deposited Al in air. We focus on the effect of the preparation technique, deposition parameters and annealing temperature on the refractive index, n, and extinction coefficient,k, of stoichiometric Al2O3. At a wavelength of 550 nm we find n of 1.50-1.67 for amorphous deposited Al2O3, 1.65-1.67 for amorphous Al2O3 obtained by Al annealing, 1.46-1.69 for gama- Al2O3 and decreasing n for Al2O3 annealing temperature increasing up to 890 °C. The results facilitate correct interpretation of optical characterization of Al2O3, as well as selection of a preparation technique corresponding to a required Al2O3 structure and properties.

Název v anglickém jazyce

Overview of optical properties of Al2O3 films prepared by various techniques

Popis výsledku anglicky

We study optical properties of Al2O3 films prepared by various techniques using spectroscopic ellipsometry. The film preparation techniques include conventional pulsed magnetron sputtering in various gas mixtures, high power impulse magnetron sputtering,annealing of as-deposited Al2O3 in an inert atmosphere and annealing of as-deposited Al in air. We focus on the effect of the preparation technique, deposition parameters and annealing temperature on the refractive index, n, and extinction coefficient,k, of stoichiometric Al2O3. At a wavelength of 550 nm we find n of 1.50-1.67 for amorphous deposited Al2O3, 1.65-1.67 for amorphous Al2O3 obtained by Al annealing, 1.46-1.69 for gama- Al2O3 and decreasing n for Al2O3 annealing temperature increasing up to 890 °C. The results facilitate correct interpretation of optical characterization of Al2O3, as well as selection of a preparation technique corresponding to a required Al2O3 structure and properties.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

<a href="/cs/project/ED1.1.00%2F02.0090" target="_blank" >ED1.1.00/02.0090: NTIS - Nové technologie pro informační společnost</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2012

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Thin Solid Films

ISSN

0040-6090

e-ISSN

—

Svazek periodika

520

Číslo periodika v rámci svazku

16

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

8

Strana od-do

5405-5408

Kód UT WoS článku

000305719000053

EID výsledku v databázi Scopus

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