Effect of energy on structure, microstructure and mechanical properties of hard Ti(Al,V)Nx films prepared by magnetron sputtering

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F17%3A43949511" target="_blank" >RIV/49777513:23520/17:43949511 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.surfcoat.2017.06.074" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2017.06.074</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2017.06.074" target="_blank" >10.1016/j.surfcoat.2017.06.074</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Effect of energy on structure, microstructure and mechanical properties of hard Ti(Al,V)Nx films prepared by magnetron sputtering

Popis výsledku v původním jazyce

The article reports on the effect of the energy E delivered to the growing film by bombarding ions Ebi and/or fast neutrals Efn on its structure, microstructure and mechanical properties, and resistance to cracking. The effect of the total delivered energy E = Ebi + Efn on the film properties is demonstrated on the Ti(Al,V)Nx films deposited by reactive magnetron sputtering. The films were sputtered on Si(111) and Mo substrates in a mixture Ar + N2 gases by a dual magnetron with closed magnetic field and equipped with TiAlV (6 at.% Al, 4 at.% V) alloy targets. It was shown that (1) The energy E is a key parameter controlling the physical and mechanical properties, and the resistance of cracking of sputtered Ti(Al,V)Nx films, (2) The structure of Ti(Al,V)Nx films varies from TiN(200) to TiN(220) with increasing energy E, (3) The Ti(Al,V)Nx films with high ratio H/E* ≥ 0.1, high elastic recovery We ≥ 60% and dense voids-free microstructure exhibit an enhanced resistance to cracking and can be produced only in the case when an sufficient energy E is delivered to the growing film either by bombarding ions Ebi or by bombarding fast neutrals Efn and (4) The energy Efn makes it possible to sputter crystalline films onto dielectric substrates held at a floating potential Us = Ufl.

Název v anglickém jazyce

Effect of energy on structure, microstructure and mechanical properties of hard Ti(Al,V)Nx films prepared by magnetron sputtering

Popis výsledku anglicky

The article reports on the effect of the energy E delivered to the growing film by bombarding ions Ebi and/or fast neutrals Efn on its structure, microstructure and mechanical properties, and resistance to cracking. The effect of the total delivered energy E = Ebi + Efn on the film properties is demonstrated on the Ti(Al,V)Nx films deposited by reactive magnetron sputtering. The films were sputtered on Si(111) and Mo substrates in a mixture Ar + N2 gases by a dual magnetron with closed magnetic field and equipped with TiAlV (6 at.% Al, 4 at.% V) alloy targets. It was shown that (1) The energy E is a key parameter controlling the physical and mechanical properties, and the resistance of cracking of sputtered Ti(Al,V)Nx films, (2) The structure of Ti(Al,V)Nx films varies from TiN(200) to TiN(220) with increasing energy E, (3) The Ti(Al,V)Nx films with high ratio H/E* ≥ 0.1, high elastic recovery We ≥ 60% and dense voids-free microstructure exhibit an enhanced resistance to cracking and can be produced only in the case when an sufficient energy E is delivered to the growing film either by bombarding ions Ebi or by bombarding fast neutrals Efn and (4) The energy Efn makes it possible to sputter crystalline films onto dielectric substrates held at a floating potential Us = Ufl.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/LO1506" target="_blank" >LO1506: Podpora udržitelnosti centra NTIS - Nové technologie pro informační společnost</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2017

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

—

Svazek periodika

332

Číslo periodika v rámci svazku

25 December 2017

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

8

Strana od-do

190-197

Kód UT WoS článku

000418968100024

EID výsledku v databázi Scopus

2-s2.0-85029468463