Thermal stability of structure, microstructure and enhanced properties of Zr–Ta–O films with a low and high Ta content
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F18%3A43949543" target="_blank" >RIV/49777513:23520/18:43949543 - isvavai.cz</a>
Výsledek na webu
<a href="https://doi.org/10.1016/j.surfcoat.2017.12.026" target="_blank" >https://doi.org/10.1016/j.surfcoat.2017.12.026</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.surfcoat.2017.12.026" target="_blank" >10.1016/j.surfcoat.2017.12.026</a>
Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Thermal stability of structure, microstructure and enhanced properties of Zr–Ta–O films with a low and high Ta content
Popis výsledku v původním jazyce
The paper reports on the thermal stability of two ternary Zr–Ta–O films (Zr25Ta5O70, Ta25Zr5O70) and two binary oxide films (ZrO2, Ta2O5) prepared by reactive high-power impulse magnetron sputtering using a pulsed reactive gas flow control. The thermal stability of the structure, microstructure, mechanical and optical properties of the films was investigated in air in the temperature range of 650 °C – 1300 °C. It was found that both ternary Zr–Ta–O films investigated exhibit an enhanced thermal stability of the as-deposited structure and enhanced properties compared to the corresponding binary oxides. The Zr25Ta5O70 film is a single-phase material with a nanocrystalline structure corresponding to the TaZr2.75O8 compound. This phase is stable up to the maximum temperature investigated (1300 °C) and the film retains a high hardness (19 GPa) and refractive index (2.25) even after the annealing to 1000 °C in air. The Ta25Zr5O70 film exhibits an amorphous structure in the as-deposited state with its thermal stability up to 800 °C, which is about 100 °C more than for the Ta2O5 film.
Název v anglickém jazyce
Thermal stability of structure, microstructure and enhanced properties of Zr–Ta–O films with a low and high Ta content
Popis výsledku anglicky
The paper reports on the thermal stability of two ternary Zr–Ta–O films (Zr25Ta5O70, Ta25Zr5O70) and two binary oxide films (ZrO2, Ta2O5) prepared by reactive high-power impulse magnetron sputtering using a pulsed reactive gas flow control. The thermal stability of the structure, microstructure, mechanical and optical properties of the films was investigated in air in the temperature range of 650 °C – 1300 °C. It was found that both ternary Zr–Ta–O films investigated exhibit an enhanced thermal stability of the as-deposited structure and enhanced properties compared to the corresponding binary oxides. The Zr25Ta5O70 film is a single-phase material with a nanocrystalline structure corresponding to the TaZr2.75O8 compound. This phase is stable up to the maximum temperature investigated (1300 °C) and the film retains a high hardness (19 GPa) and refractive index (2.25) even after the annealing to 1000 °C in air. The Ta25Zr5O70 film exhibits an amorphous structure in the as-deposited state with its thermal stability up to 800 °C, which is about 100 °C more than for the Ta2O5 film.
Klasifikace
Druh
J<sub>imp</sub> - Článek v periodiku v databázi Web of Science
CEP obor
—
OECD FORD obor
20506 - Coating and films
Návaznosti výsledku
Projekt
<a href="/cs/project/GA16-18183S" target="_blank" >GA16-18183S: Pokročilé povrchové povlaky se zlepšenými vlastnostmi a teplotní stabilitou</a><br>
Návaznosti
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Ostatní
Rok uplatnění
2018
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Údaje specifické pro druh výsledku
Název periodika
Surface and Coatings Technology
ISSN
0257-8972
e-ISSN
—
Svazek periodika
335
Číslo periodika v rámci svazku
15 February 2018
Stát vydavatele periodika
CH - Švýcarská konfederace
Počet stran výsledku
9
Strana od-do
95-103
Kód UT WoS článku
000424720800011
EID výsledku v databázi Scopus
2-s2.0-85038809274