Irradiation of sputtered Al–Si–N coatings by pulsed 200 keV C+ ion beam

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F18%3A43952918" target="_blank" >RIV/49777513:23520/18:43952918 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1016/j.vacuum.2018.09.022" target="_blank" >https://doi.org/10.1016/j.vacuum.2018.09.022</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.vacuum.2018.09.022" target="_blank" >10.1016/j.vacuum.2018.09.022</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Irradiation of sputtered Al–Si–N coatings by pulsed 200 keV C+ ion beam

Popis výsledku v původním jazyce

This paper reports on the effect of the irradiation of Al–Si–N coatings by an intense pulsed ion beam. The Al–Si–N coating was deposited on a steel substrate by a reactive magnetron sputtering. The Al–Si–N coating with a high silicon content (30 at.%) was irradiated by a high-intense pulsed C+ ion beam. It was shown that metastable growth defects (GDs) created in the Al–Si–N coating during deposition can be healed up by its post-deposition irradiation using several pulses (1 and 10) of C+ ions with energy Ei = 200 keV, ion current density is = 7 A/cm^2, pulse duration tp = 110 ns and radiation dose 2 MGy. The reduction in deposition-induced GD density results in an increased transmittance of the Al–Si–N coatings.

Název v anglickém jazyce

Irradiation of sputtered Al–Si–N coatings by pulsed 200 keV C+ ion beam

Popis výsledku anglicky

This paper reports on the effect of the irradiation of Al–Si–N coatings by an intense pulsed ion beam. The Al–Si–N coating was deposited on a steel substrate by a reactive magnetron sputtering. The Al–Si–N coating with a high silicon content (30 at.%) was irradiated by a high-intense pulsed C+ ion beam. It was shown that metastable growth defects (GDs) created in the Al–Si–N coating during deposition can be healed up by its post-deposition irradiation using several pulses (1 and 10) of C+ ions with energy Ei = 200 keV, ion current density is = 7 A/cm^2, pulse duration tp = 110 ns and radiation dose 2 MGy. The reduction in deposition-induced GD density results in an increased transmittance of the Al–Si–N coatings.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2018

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Vacuum

ISSN

0042-207X

e-ISSN

—

Svazek periodika

158

Číslo periodika v rámci svazku

DEC 2018

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

3

Strana od-do

65-67

Kód UT WoS článku

000449897400011

EID výsledku v databázi Scopus

2-s2.0-85053772542