Effect of annealing on structure and properties of Ta–O–N films prepared by high power impulse magnetron sputtering

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F19%3A43953437" target="_blank" >RIV/49777513:23520/19:43953437 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1016/j.ceramint.2018.09.019" target="_blank" >https://doi.org/10.1016/j.ceramint.2018.09.019</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.ceramint.2018.09.019" target="_blank" >10.1016/j.ceramint.2018.09.019</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Effect of annealing on structure and properties of Ta–O–N films prepared by high power impulse magnetron sputtering

Popis výsledku v původním jazyce

High power impulse magnetron sputtering of a Ta target in various Ar + O2 + N2 gas mixtures was utilized to prepare amorphous tantalum oxynitride (Ta–O–N) films with a finely controlled elemental composition in a wide range. We investigate the effect of film annealing at 900 °C in vacuum on structure and properties of the films. We show that the finely tuned elemental composition in combination with the annealing enables the preparation of crystalline Ta–O–N films exhibiting a single TaON phase with a monoclinic lattice structure, refractive index of 2.65 and extinction coefficient of 0.02 (both at the wavelength of 550 nm), optical band gap width of 2.45 eV (suitable for visible light absorption up to 505 nm), low electrical resistivity of 0.4 Ω·cm (indicating enhanced charge transport in the material as compared to the as-deposited counterpart), and appropriate alignment of the band gap with respect to the redox potentials for water splitting. These films are therefore promising candidates for application as visible-light-driven photocatalysts for water splitting.

Název v anglickém jazyce

Effect of annealing on structure and properties of Ta–O–N films prepared by high power impulse magnetron sputtering

Popis výsledku anglicky

High power impulse magnetron sputtering of a Ta target in various Ar + O2 + N2 gas mixtures was utilized to prepare amorphous tantalum oxynitride (Ta–O–N) films with a finely controlled elemental composition in a wide range. We investigate the effect of film annealing at 900 °C in vacuum on structure and properties of the films. We show that the finely tuned elemental composition in combination with the annealing enables the preparation of crystalline Ta–O–N films exhibiting a single TaON phase with a monoclinic lattice structure, refractive index of 2.65 and extinction coefficient of 0.02 (both at the wavelength of 550 nm), optical band gap width of 2.45 eV (suitable for visible light absorption up to 505 nm), low electrical resistivity of 0.4 Ω·cm (indicating enhanced charge transport in the material as compared to the as-deposited counterpart), and appropriate alignment of the band gap with respect to the redox potentials for water splitting. These films are therefore promising candidates for application as visible-light-driven photocatalysts for water splitting.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/LO1506" target="_blank" >LO1506: Podpora udržitelnosti centra NTIS - Nové technologie pro informační společnost</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2019

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

CERAMICS INTERNATIONAL

ISSN

0272-8842

e-ISSN

—

Svazek periodika

45

Číslo periodika v rámci svazku

7

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

8

Strana od-do

9454-9461

Kód UT WoS článku

000463688400020

EID výsledku v databázi Scopus

2-s2.0-85054094338