Extraordinary high-temperature behavior of electrically conductive Hf7B23Si22C6N40 ceramic film

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F20%3A43958595" target="_blank" >RIV/49777513:23520/20:43958595 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1016/j.surfcoat.2020.125686" target="_blank" >https://doi.org/10.1016/j.surfcoat.2020.125686</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2020.125686" target="_blank" >10.1016/j.surfcoat.2020.125686</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Extraordinary high-temperature behavior of electrically conductive Hf7B23Si22C6N40 ceramic film

Popis výsledku v původním jazyce

The high-temperature behavior of an electrically conductive, opaque and hard Hf7B23Si22C6N40 ceramic film with an amorphous structure was systematically investigated in air up to 1700 °C and inert gases up to 1600 °C. The film was prepared by reactive pulsed dc magnetron sputter deposition in an argon-nitrogen gas mixture. The study is focused on the oxidation resistance of the film and the evolution of the structure, microstructure and elemental composition upon annealing in air and argon, and on the thermal stability of its hardness and electrical resistivity upon annealing in helium. The film exhibits an excellent oxidation resistance up to 1600 °C due to the formation of a compact protective oxide surface layer with a nanocomposite structure consisting of monoclinic and tetragonal/orthorhombic HfO2 nanocrystallites surrounded by a SiO2-based amorphous matrix. The film itself crystallizes into several phases such as HfB2, HfC0.5N0.5 and α-Si3N4 upon annealing but its elemental composition remains unaffected up to 1600 °C. In addition, the hardness and electrical resistivity exhibit also very high thermal stability.

Název v anglickém jazyce

Extraordinary high-temperature behavior of electrically conductive Hf7B23Si22C6N40 ceramic film

Popis výsledku anglicky

The high-temperature behavior of an electrically conductive, opaque and hard Hf7B23Si22C6N40 ceramic film with an amorphous structure was systematically investigated in air up to 1700 °C and inert gases up to 1600 °C. The film was prepared by reactive pulsed dc magnetron sputter deposition in an argon-nitrogen gas mixture. The study is focused on the oxidation resistance of the film and the evolution of the structure, microstructure and elemental composition upon annealing in air and argon, and on the thermal stability of its hardness and electrical resistivity upon annealing in helium. The film exhibits an excellent oxidation resistance up to 1600 °C due to the formation of a compact protective oxide surface layer with a nanocomposite structure consisting of monoclinic and tetragonal/orthorhombic HfO2 nanocrystallites surrounded by a SiO2-based amorphous matrix. The film itself crystallizes into several phases such as HfB2, HfC0.5N0.5 and α-Si3N4 upon annealing but its elemental composition remains unaffected up to 1600 °C. In addition, the hardness and electrical resistivity exhibit also very high thermal stability.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/GA17-08944S" target="_blank" >GA17-08944S: Nanostrukturní povlaky syntetizované užitím vysoce reaktivního pulzního plazmatu</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2020

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

—

Svazek periodika

391

Číslo periodika v rámci svazku

15 JUN 2020

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

8

Strana od-do

„125686-1“-„125686-8“

Kód UT WoS článku

000532675000009

EID výsledku v databázi Scopus

2-s2.0-85082687620