Enhancement of high-temperature oxidation resistance and thermal stability of hard and optically transparent Hf–B–Si–C–N films by Y or Ho addition

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F21%3A43960380" target="_blank" >RIV/49777513:23520/21:43960380 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1016/j.jnoncrysol.2020.120470" target="_blank" >https://doi.org/10.1016/j.jnoncrysol.2020.120470</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.jnoncrysol.2020.120470" target="_blank" >10.1016/j.jnoncrysol.2020.120470</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Enhancement of high-temperature oxidation resistance and thermal stability of hard and optically transparent Hf–B–Si–C–N films by Y or Ho addition

Popis výsledku v původním jazyce

Hard and optically transparent amorphous Hf7B10Si32C2N44, Hf6B12Si29Y2C2N45 and Hf5B13Si25Ho3C2N48 films were prepared and examined for the oxidation resistance in air and thermal stability in inert gasses up to 1600 °C. A thermal evolution of their structure, hardness and optical properties was also studied. An addition of Y or Ho (2–3 at.%) into Hf–B–Si–C–N films leads to a stabilization of tetragonal HfO2 in a surface oxide layer upon oxidation. The thickness of this layer is the lowest for the Y addition. Upon annealing in He, no mass changes are detected up to 1315 °C and this temperature is shifted even to 1350 °C for the Hf6B12Si29Y2C2N45 film. The hardness of this film is enhanced from 22.2 GPa in the as-deposited state to 25.9 GPa after annealing to 1300 °C and the film retains its optical transparency up to 1400 °C. The crystallization of the amorphous structure occurs at around 1400 °C.

Název v anglickém jazyce

Enhancement of high-temperature oxidation resistance and thermal stability of hard and optically transparent Hf–B–Si–C–N films by Y or Ho addition

Popis výsledku anglicky

Hard and optically transparent amorphous Hf7B10Si32C2N44, Hf6B12Si29Y2C2N45 and Hf5B13Si25Ho3C2N48 films were prepared and examined for the oxidation resistance in air and thermal stability in inert gasses up to 1600 °C. A thermal evolution of their structure, hardness and optical properties was also studied. An addition of Y or Ho (2–3 at.%) into Hf–B–Si–C–N films leads to a stabilization of tetragonal HfO2 in a surface oxide layer upon oxidation. The thickness of this layer is the lowest for the Y addition. Upon annealing in He, no mass changes are detected up to 1315 °C and this temperature is shifted even to 1350 °C for the Hf6B12Si29Y2C2N45 film. The hardness of this film is enhanced from 22.2 GPa in the as-deposited state to 25.9 GPa after annealing to 1300 °C and the film retains its optical transparency up to 1400 °C. The crystallization of the amorphous structure occurs at around 1400 °C.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/LO1506" target="_blank" >LO1506: Podpora udržitelnosti centra NTIS - Nové technologie pro informační společnost</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

JOURNAL OF NON-CRYSTALLINE SOLIDS

ISSN

0022-3093

e-ISSN

—

Svazek periodika

553

Číslo periodika v rámci svazku

1 FEB 2021

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

7

Strana od-do

„120470-1“-„120470-7“

Kód UT WoS článku

000612133200015

EID výsledku v databázi Scopus

2-s2.0-85093663900