Hard alloy films with enhanced resistance to cracking
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F20%3A43960447" target="_blank" >RIV/49777513:23520/20:43960447 - isvavai.cz</a>
Výsledek na webu
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DOI - Digital Object Identifier
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Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Hard alloy films with enhanced resistance to cracking
Popis výsledku v původním jazyce
The work reports on the mechanical properties of alloy films prepared by magnetron sputtering. It is known that alloy films easily crack due to a low ratio H/E* < 0.1; here H is the hardness and E* is the effective Young’s modulus of the film. Cracking is a great drawback of alloy films as it strongly limits many of their practical applications. Therefore, it is important to develop new advanced alloy films with high hardness and enhanced resistance to cracking and that is the subject of the present investigation. It is shown that hard alloy films resistant to cracking must exhibit a high ratio H/E* ≥ 0.1, elastic recovery We > 60 %, compressive macrostress (σ < 0) and dense, voids-free microstructure. Deposition conditions under which such alloy films can be formed are given and mechanical properties of the Si-based hard alloy films with enhanced resistance to cracking are provided as examples.
Název v anglickém jazyce
Hard alloy films with enhanced resistance to cracking
Popis výsledku anglicky
The work reports on the mechanical properties of alloy films prepared by magnetron sputtering. It is known that alloy films easily crack due to a low ratio H/E* < 0.1; here H is the hardness and E* is the effective Young’s modulus of the film. Cracking is a great drawback of alloy films as it strongly limits many of their practical applications. Therefore, it is important to develop new advanced alloy films with high hardness and enhanced resistance to cracking and that is the subject of the present investigation. It is shown that hard alloy films resistant to cracking must exhibit a high ratio H/E* ≥ 0.1, elastic recovery We > 60 %, compressive macrostress (σ < 0) and dense, voids-free microstructure. Deposition conditions under which such alloy films can be formed are given and mechanical properties of the Si-based hard alloy films with enhanced resistance to cracking are provided as examples.
Klasifikace
Druh
O - Ostatní výsledky
CEP obor
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OECD FORD obor
20506 - Coating and films
Návaznosti výsledku
Projekt
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Návaznosti
S - Specificky vyzkum na vysokych skolach
Ostatní
Rok uplatnění
2020
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů