Tungsten Oxide Based Hydrogen Gas Sensor Prepared by Advanced Magnetron Sputtering

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F21%3A43962620" target="_blank" >RIV/49777513:23520/21:43962620 - isvavai.cz</a>

Výsledek na webu

—

DOI - Digital Object Identifier

—

Jazyk výsledku

angličtina

Název v původním jazyce

Tungsten Oxide Based Hydrogen Gas Sensor Prepared by Advanced Magnetron Sputtering

Popis výsledku v původním jazyce

In this study, we demonstrate the advantages of two advanced sputtering techniques for the preparation of a thin-film conductometric gas sensor. We combined tungsten oxide (WO3) thin films with other materials to achieve enhanced sensorial behavior towards hydrogen. Thin films of WO3 were prepared by the DC and HiPIMS technique, which allowed us to tune the phase composition and crystallinity of the oxide by changing the deposition parameters. Then, the second material was added on-top of these films. We used the copper tungstate CuWO4 in a form of nano-islands deposited by reactive rf sputtering and Pd particles formed during conventional dc sputtering. The specimens were tested for the response to a time-varied hydrogen concentration in synthetic air at various temperatures. The sensitivity and response time were evaluated. The performance of individual films is presented as well as the details of the synthesis. Advanced magnetron techniques (such as HiPIMS) allow us to tune the property of the film to improve the sensorial behavior. The method is compatible with the silicon electronics industry, which consists of a few steps that don&apos;t require any wet technique and films can be used in an as-deposited state. Therefore, sensorial nanostructured materials prepared by magnetron sputtering are very suitable for use in miniaturized electronic devices.

Název v anglickém jazyce

Tungsten Oxide Based Hydrogen Gas Sensor Prepared by Advanced Magnetron Sputtering

Popis výsledku anglicky

In this study, we demonstrate the advantages of two advanced sputtering techniques for the preparation of a thin-film conductometric gas sensor. We combined tungsten oxide (WO3) thin films with other materials to achieve enhanced sensorial behavior towards hydrogen. Thin films of WO3 were prepared by the DC and HiPIMS technique, which allowed us to tune the phase composition and crystallinity of the oxide by changing the deposition parameters. Then, the second material was added on-top of these films. We used the copper tungstate CuWO4 in a form of nano-islands deposited by reactive rf sputtering and Pd particles formed during conventional dc sputtering. The specimens were tested for the response to a time-varied hydrogen concentration in synthetic air at various temperatures. The sensitivity and response time were evaluated. The performance of individual films is presented as well as the details of the synthesis. Advanced magnetron techniques (such as HiPIMS) allow us to tune the property of the film to improve the sensorial behavior. The method is compatible with the silicon electronics industry, which consists of a few steps that don&apos;t require any wet technique and films can be used in an as-deposited state. Therefore, sensorial nanostructured materials prepared by magnetron sputtering are very suitable for use in miniaturized electronic devices.

Druh

O - Ostatní výsledky

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

—

Návaznosti

S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů