Particle-based simulation of atom and ion transport in HiPIMS: effect of the plasma potential distribution on the ionized flux fraction

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F23%3A43968385" target="_blank" >RIV/49777513:23520/23:43968385 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1088/1361-6595/acc549" target="_blank" >https://doi.org/10.1088/1361-6595/acc549</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1361-6595/acc549" target="_blank" >10.1088/1361-6595/acc549</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Particle-based simulation of atom and ion transport in HiPIMS: effect of the plasma potential distribution on the ionized flux fraction

Popis výsledku v původním jazyce

We present a three-dimensional particle-based computer simulation of high-power impulse magnetron sputtering (HiPIMS) discharges which enables us to simulate the transport of atoms and ions in the discharge and the corresponding plasma parameters. A numerical algorithm is used to constrain the simulation by an experimental target current waveform, which ensures that the simulation results are closely tied to the experimental discharge conditions. Simulations of a HiPIMS discharge with Ti target show the capability to calculate the spatial distributions of target material atoms and ions and also to quantify the process-gas rarefaction. We evaluated, among others, the ion return probability and the ionized fraction of the target material flux onto the substrate for various values of the potential difference across the magnetic presheath in front of the target racetrack, which is responsible for attracting most of the plasma ions towards the target.

Název v anglickém jazyce

Particle-based simulation of atom and ion transport in HiPIMS: effect of the plasma potential distribution on the ionized flux fraction

Popis výsledku anglicky

We present a three-dimensional particle-based computer simulation of high-power impulse magnetron sputtering (HiPIMS) discharges which enables us to simulate the transport of atoms and ions in the discharge and the corresponding plasma parameters. A numerical algorithm is used to constrain the simulation by an experimental target current waveform, which ensures that the simulation results are closely tied to the experimental discharge conditions. Simulations of a HiPIMS discharge with Ti target show the capability to calculate the spatial distributions of target material atoms and ions and also to quantify the process-gas rarefaction. We evaluated, among others, the ion return probability and the ionized fraction of the target material flux onto the substrate for various values of the potential difference across the magnetic presheath in front of the target racetrack, which is responsible for attracting most of the plasma ions towards the target.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2023

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

PLASMA SOURCES SCIENCE &amp; TECHNOLOGY

ISSN

0963-0252

e-ISSN

1361-6595

Svazek periodika

32

Číslo periodika v rámci svazku

3

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

16

Strana od-do

"035007-1"-"035007-16"

Kód UT WoS článku

000962002200001

EID výsledku v databázi Scopus

2-s2.0-85151619056