On the surface biasing effectiveness during reactive high-power impulse magnetron sputter deposition of zirconium dioxide

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F23%3A43968941" target="_blank" >RIV/49777513:23520/23:43968941 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1016/j.apsusc.2023.158131" target="_blank" >https://doi.org/10.1016/j.apsusc.2023.158131</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.apsusc.2023.158131" target="_blank" >10.1016/j.apsusc.2023.158131</a>

Jazyk výsledku

angličtina

Název v původním jazyce

On the surface biasing effectiveness during reactive high-power impulse magnetron sputter deposition of zirconium dioxide

Popis výsledku v původním jazyce

In this study, we investigate the effect of surface biasing during high-power impulse magnetron sputter deposition of non-conductive zirconium dioxide films on substrates with different capacitances. We employ reactive high-power impulse magnetron sputtering to deposit ZrO2 films using a circular Zr target in a pure oxygen atmosphere. The deposition experiments are conducted on two types of substrates: high-capacitance (thin thermally grown SiO2 on Si) and low-capacitance (soda-lime glass). By varying the time shift between the target voltage pulse and the negative substrate bias voltage pulse, we analyze the impact on the preferred crystal orientation of the deposited ZrO2 films and the deposition rate. We measure the current and voltage waveforms, during the deposition process and utilize a surface charging model to understand the charging behavior of the growing film. Additionally, time- and energy-resolved ion mass spectra are measured to gain insights into the ion behavior during film growth. Our results demonstrate that energetic ion bombardment and appropriate timing of substrate biasing can influence the crystal orientation of ZrO2 films, favouring specific orientations over others. We also explain the different behavior observed on low- and high-capacitance substrates.

Název v anglickém jazyce

On the surface biasing effectiveness during reactive high-power impulse magnetron sputter deposition of zirconium dioxide

Popis výsledku anglicky

In this study, we investigate the effect of surface biasing during high-power impulse magnetron sputter deposition of non-conductive zirconium dioxide films on substrates with different capacitances. We employ reactive high-power impulse magnetron sputtering to deposit ZrO2 films using a circular Zr target in a pure oxygen atmosphere. The deposition experiments are conducted on two types of substrates: high-capacitance (thin thermally grown SiO2 on Si) and low-capacitance (soda-lime glass). By varying the time shift between the target voltage pulse and the negative substrate bias voltage pulse, we analyze the impact on the preferred crystal orientation of the deposited ZrO2 films and the deposition rate. We measure the current and voltage waveforms, during the deposition process and utilize a surface charging model to understand the charging behavior of the growing film. Additionally, time- and energy-resolved ion mass spectra are measured to gain insights into the ion behavior during film growth. Our results demonstrate that energetic ion bombardment and appropriate timing of substrate biasing can influence the crystal orientation of ZrO2 films, favouring specific orientations over others. We also explain the different behavior observed on low- and high-capacitance substrates.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/GA21-28277S" target="_blank" >GA21-28277S: Vysoce účinné termochromické povlaky na bázi VO2 s nízkou přechodovou teplotou připravené pomocí reaktivního pulzního plazmatu</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2023

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

APPLIED SURFACE SCIENCE

ISSN

0169-4332

e-ISSN

1873-5584

Svazek periodika

638

Číslo periodika v rámci svazku

30 NOV 2023

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

10

Strana od-do

1-10

Kód UT WoS článku

001140304500001

EID výsledku v databázi Scopus

2-s2.0-85166476666