Effects of power per pulse on reactive HiPIMS deposition of ZrO2 films: A time-resolved optical emission spectroscopy study

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F19%3A43956580" target="_blank" >RIV/49777513:23520/19:43956580 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1116/1.5125721" target="_blank" >https://doi.org/10.1116/1.5125721</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1116/1.5125721" target="_blank" >10.1116/1.5125721</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Effects of power per pulse on reactive HiPIMS deposition of ZrO2 films: A time-resolved optical emission spectroscopy study

Popis výsledku v původním jazyce

Time-resolved optical emission spectroscopy was carried out during controlled reactive high-power impulse magnetron sputtering of ZrO2 films in argon-oxygen gas mixtures. The effects of increased target power density applied in voltage pulses shortened from 200 to 50 μs were studied. It was found that the sputtered Zr atoms are much more ionized and the Ar atom density is more decreased near the target during the shorter (50 μs) high-power pulses. The higher backward flux of the Zr ions onto the target during this high-power discharge regime contributed significantly to a 34% decrease in the efficiency of the magnetron sputter deposition of ZrO2 films.

Název v anglickém jazyce

Effects of power per pulse on reactive HiPIMS deposition of ZrO2 films: A time-resolved optical emission spectroscopy study

Popis výsledku anglicky

Time-resolved optical emission spectroscopy was carried out during controlled reactive high-power impulse magnetron sputtering of ZrO2 films in argon-oxygen gas mixtures. The effects of increased target power density applied in voltage pulses shortened from 200 to 50 μs were studied. It was found that the sputtered Zr atoms are much more ionized and the Ar atom density is more decreased near the target during the shorter (50 μs) high-power pulses. The higher backward flux of the Zr ions onto the target during this high-power discharge regime contributed significantly to a 34% decrease in the efficiency of the magnetron sputter deposition of ZrO2 films.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/GA17-08944S" target="_blank" >GA17-08944S: Nanostrukturní povlaky syntetizované užitím vysoce reaktivního pulzního plazmatu</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2019

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Vacuum Science and Technology A

ISSN

0734-2101

e-ISSN

—

Svazek periodika

37

Číslo periodika v rámci svazku

6

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

10

Strana od-do

„061305-1“-„061305-10“

Kód UT WoS článku

000504231200016

EID výsledku v databázi Scopus

2-s2.0-85075457325