Optical emission spectroscopy during the deposition of zirconium dioxide films by controlled reactive high-power impulse magnetron sputtering

Kód výsledku v IS VaVaI

RIV/49777513:23520/17:43931481 - isvavai.cz

Výsledek na webu

http://dx.doi.org/10.1063/1.4977822

DOI - Digital Object Identifier

10.1063/1.4977822

Jazyk výsledku

angličtina

Název v původním jazyce

Optical emission spectroscopy during the deposition of zirconium dioxide films by controlled reactive high-power impulse magnetron sputtering

Popis výsledku v původním jazyce

Time-resolved optical emission spectroscopy was performed near the sputtered Zr target and in a plasma bulk during a controlled high-rate reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films in argon-oxygen gas mixtures at the argon pressure of 2 Pa. The repetition frequency was 500 Hz at the deposition-averaged target power density of 52 W/cm^2 with a peak target power density of 1100 W/cm^2. The voltage pulse duration was 200 µs. From the time evolutions of the excited-state populations for the chosen atoms (Zr, Ar, and O) and ions (Zr+, Zr2+, Ar+, and O+), and of the excitation temperature during a voltage pulse, the trends in a time evolution of the local ground-state densities of these atoms and ions during the voltage pulse were derived. Near the target, a decrease in the ground-state densities of Ar and O atoms, caused by a gas rarefaction and intense electron-impact ionization, was observed in the first half of the voltage pulse. Simultaneous, very effective electron-impact ionization of sputtered Zr atoms was proved. A composition of particle fluxes onto the substrate during a film deposition was found almost independent of the instantaneous oscillating oxygen partial pressure.

Název v anglickém jazyce

Optical emission spectroscopy during the deposition of zirconium dioxide films by controlled reactive high-power impulse magnetron sputtering

Popis výsledku anglicky

Time-resolved optical emission spectroscopy was performed near the sputtered Zr target and in a plasma bulk during a controlled high-rate reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films in argon-oxygen gas mixtures at the argon pressure of 2 Pa. The repetition frequency was 500 Hz at the deposition-averaged target power density of 52 W/cm^2 with a peak target power density of 1100 W/cm^2. The voltage pulse duration was 200 µs. From the time evolutions of the excited-state populations for the chosen atoms (Zr, Ar, and O) and ions (Zr+, Zr2+, Ar+, and O+), and of the excitation temperature during a voltage pulse, the trends in a time evolution of the local ground-state densities of these atoms and ions during the voltage pulse were derived. Near the target, a decrease in the ground-state densities of Ar and O atoms, caused by a gas rarefaction and intense electron-impact ionization, was observed in the first half of the voltage pulse. Simultaneous, very effective electron-impact ionization of sputtered Zr atoms was proved. A composition of particle fluxes onto the substrate during a film deposition was found almost independent of the instantaneous oscillating oxygen partial pressure.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

GA14-03875S: Nanostrukturní multifunkční povlaky připravené užitím silně ionizovaného pulzního plazmatu

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2017

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Applied Physics

ISSN

0021-8979

e-ISSN

—

Svazek periodika

121

Číslo periodika v rámci svazku

17

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

11

Strana od-do

„171908-1“-„171908-11“

Kód UT WoS článku

000400623700010

EID výsledku v databázi Scopus

2-s2.0-85014919923