Optical emission spectroscopy during the deposition of zirconium dioxide films by controlled reactive high-power impulse magnetron sputtering
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F17%3A43931481" target="_blank" >RIV/49777513:23520/17:43931481 - isvavai.cz</a>
Výsledek na webu
<a href="http://dx.doi.org/10.1063/1.4977822" target="_blank" >http://dx.doi.org/10.1063/1.4977822</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1063/1.4977822" target="_blank" >10.1063/1.4977822</a>
Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Optical emission spectroscopy during the deposition of zirconium dioxide films by controlled reactive high-power impulse magnetron sputtering
Popis výsledku v původním jazyce
Time-resolved optical emission spectroscopy was performed near the sputtered Zr target and in a plasma bulk during a controlled high-rate reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films in argon-oxygen gas mixtures at the argon pressure of 2 Pa. The repetition frequency was 500 Hz at the deposition-averaged target power density of 52 W/cm^2 with a peak target power density of 1100 W/cm^2. The voltage pulse duration was 200 µs. From the time evolutions of the excited-state populations for the chosen atoms (Zr, Ar, and O) and ions (Zr+, Zr2+, Ar+, and O+), and of the excitation temperature during a voltage pulse, the trends in a time evolution of the local ground-state densities of these atoms and ions during the voltage pulse were derived. Near the target, a decrease in the ground-state densities of Ar and O atoms, caused by a gas rarefaction and intense electron-impact ionization, was observed in the first half of the voltage pulse. Simultaneous, very effective electron-impact ionization of sputtered Zr atoms was proved. A composition of particle fluxes onto the substrate during a film deposition was found almost independent of the instantaneous oscillating oxygen partial pressure.
Název v anglickém jazyce
Optical emission spectroscopy during the deposition of zirconium dioxide films by controlled reactive high-power impulse magnetron sputtering
Popis výsledku anglicky
Time-resolved optical emission spectroscopy was performed near the sputtered Zr target and in a plasma bulk during a controlled high-rate reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films in argon-oxygen gas mixtures at the argon pressure of 2 Pa. The repetition frequency was 500 Hz at the deposition-averaged target power density of 52 W/cm^2 with a peak target power density of 1100 W/cm^2. The voltage pulse duration was 200 µs. From the time evolutions of the excited-state populations for the chosen atoms (Zr, Ar, and O) and ions (Zr+, Zr2+, Ar+, and O+), and of the excitation temperature during a voltage pulse, the trends in a time evolution of the local ground-state densities of these atoms and ions during the voltage pulse were derived. Near the target, a decrease in the ground-state densities of Ar and O atoms, caused by a gas rarefaction and intense electron-impact ionization, was observed in the first half of the voltage pulse. Simultaneous, very effective electron-impact ionization of sputtered Zr atoms was proved. A composition of particle fluxes onto the substrate during a film deposition was found almost independent of the instantaneous oscillating oxygen partial pressure.
Klasifikace
Druh
J<sub>imp</sub> - Článek v periodiku v databázi Web of Science
CEP obor
—
OECD FORD obor
10305 - Fluids and plasma physics (including surface physics)
Návaznosti výsledku
Projekt
<a href="/cs/project/GA14-03875S" target="_blank" >GA14-03875S: Nanostrukturní multifunkční povlaky připravené užitím silně ionizovaného pulzního plazmatu</a><br>
Návaznosti
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Ostatní
Rok uplatnění
2017
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Údaje specifické pro druh výsledku
Název periodika
Journal of Applied Physics
ISSN
0021-8979
e-ISSN
—
Svazek periodika
121
Číslo periodika v rámci svazku
17
Stát vydavatele periodika
US - Spojené státy americké
Počet stran výsledku
11
Strana od-do
„171908-1“-„171908-11“
Kód UT WoS článku
000400623700010
EID výsledku v databázi Scopus
2-s2.0-85014919923