Studying the transport of atoms sputtered from a compound NbC target in HiPIMS discharges: plasma diagnostics and modelling

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F23%3A43969322" target="_blank" >RIV/49777513:23520/23:43969322 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Studying the transport of atoms sputtered from a compound NbC target in HiPIMS discharges: plasma diagnostics and modelling

Popis výsledku v původním jazyce

This presentation focuses on explaining the observed change in the composition of NbC films (prepared by HiPIMS) with the increase in the pulse-averaged power density (realized by shortening the pulse length). To untangle the influence of the plasma processes on the transport of atoms in the discharge and, eventually, on the C/Nb ratio in the films, we use several plasma diagnostics techniques and modelling approaches. We measure Nb+ and C+ fluxes at the substrate position by energy-resolved mass spectroscopy and evaluate the ratios of Nb and C neutral and ion species at various positions in the discharge by optical emission spectroscopy. Using a pathway discharge model and particle-based Monte Carlo simulations, we analyze the ionization and return probabilities of Nb+ and C+ ions and their effect on the sputtering process and, consequently, the film composition.

Název v anglickém jazyce

Studying the transport of atoms sputtered from a compound NbC target in HiPIMS discharges: plasma diagnostics and modelling

Popis výsledku anglicky

This presentation focuses on explaining the observed change in the composition of NbC films (prepared by HiPIMS) with the increase in the pulse-averaged power density (realized by shortening the pulse length). To untangle the influence of the plasma processes on the transport of atoms in the discharge and, eventually, on the C/Nb ratio in the films, we use several plasma diagnostics techniques and modelling approaches. We measure Nb+ and C+ fluxes at the substrate position by energy-resolved mass spectroscopy and evaluate the ratios of Nb and C neutral and ion species at various positions in the discharge by optical emission spectroscopy. Using a pathway discharge model and particle-based Monte Carlo simulations, we analyze the ionization and return probabilities of Nb+ and C+ ions and their effect on the sputtering process and, consequently, the film composition.

Druh

O - Ostatní výsledky

CEP obor

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OECD FORD obor

20506 - Coating and films

Projekt

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Návaznosti

S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2023

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů