On double-layer and reverse discharge creation during long positive voltage pulses in a bipolar HiPIMS discharge

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F24%3A43971960" target="_blank" >RIV/49777513:23520/24:43971960 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1088/1361-6595/ad3e29" target="_blank" >https://doi.org/10.1088/1361-6595/ad3e29</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1361-6595/ad3e29" target="_blank" >10.1088/1361-6595/ad3e29</a>

Jazyk výsledku

angličtina

Název v původním jazyce

On double-layer and reverse discharge creation during long positive voltage pulses in a bipolar HiPIMS discharge

Popis výsledku v původním jazyce

Time-resolved Langmuir probe diagnostics at the discharge centerline and at three distances from the target (35 mm, 60 mm, and 100 mm) was carried out during long positive voltage pulses (a duration of 500 µs and a preset positive voltage of 100 V) in bipolar High-Power Impulse Magnetron Sputtering of a Ti target (a diameter of 100 mm) using an unbalanced magnetron. Fast-camera spectroscopy imaging recorded light emission from Ar and Ti atoms and singly charged ions during positive voltage pulses. It was found that during the long positive voltage pulse, the floating and the plasma potentials suddenly decrease, which is accompanied by the presence of anode light located on the discharge centerline between the target center and the magnetic null of the magnetron&apos;s magnetic field. These light patterns are related to the ignition of a reverse discharge, which leads to the subsequent rise in the plasma and the floating potentials. The reversed discharge is burning up to the end of the positive voltage pulse, but the plasma and floating potentials have lower values than the values from the initial part of the positive voltage pulse. Secondary electron emission induced by the impinging Ar+ ions to the grounded surfaces in the vicinity of the discharge plasma together with the mirror configuration of the magnetron magnetic field are identified as the probable causes of the charge double-layer structure formation in front of the target and the ignition of the reverse discharge.

Název v anglickém jazyce

On double-layer and reverse discharge creation during long positive voltage pulses in a bipolar HiPIMS discharge

Popis výsledku anglicky

Time-resolved Langmuir probe diagnostics at the discharge centerline and at three distances from the target (35 mm, 60 mm, and 100 mm) was carried out during long positive voltage pulses (a duration of 500 µs and a preset positive voltage of 100 V) in bipolar High-Power Impulse Magnetron Sputtering of a Ti target (a diameter of 100 mm) using an unbalanced magnetron. Fast-camera spectroscopy imaging recorded light emission from Ar and Ti atoms and singly charged ions during positive voltage pulses. It was found that during the long positive voltage pulse, the floating and the plasma potentials suddenly decrease, which is accompanied by the presence of anode light located on the discharge centerline between the target center and the magnetic null of the magnetron&apos;s magnetic field. These light patterns are related to the ignition of a reverse discharge, which leads to the subsequent rise in the plasma and the floating potentials. The reversed discharge is burning up to the end of the positive voltage pulse, but the plasma and floating potentials have lower values than the values from the initial part of the positive voltage pulse. Secondary electron emission induced by the impinging Ar+ ions to the grounded surfaces in the vicinity of the discharge plasma together with the mirror configuration of the magnetron magnetic field are identified as the probable causes of the charge double-layer structure formation in front of the target and the ignition of the reverse discharge.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

<a href="/cs/project/EH22_008%2F0004572" target="_blank" >EH22_008/0004572: Kvantové materiály pro aplikace v udržitelných technologiích</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2024

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Plasma Sources Science and Technology

ISSN

0963-0252

e-ISSN

1361-6595

Svazek periodika

33

Číslo periodika v rámci svazku

5

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

14

Strana od-do

—

Kód UT WoS článku

001220303700001

EID výsledku v databázi Scopus

2-s2.0-85193212836