Reverse discharge in bipolar HiPIMS and its dependence on magnetic field geometry

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F24%3A43972626" target="_blank" >RIV/49777513:23520/24:43972626 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Reverse discharge in bipolar HiPIMS and its dependence on magnetic field geometry

Popis výsledku v původním jazyce

Bipolar high-power impulse magnetron sputtering (BP-HiPIMS) includes a positive voltage pulse (PP) after a negative voltage pulse (NP) to enhance film deposition. The positive pulse propels ions towards the substrate, increasing deposition rate and film hardness. Sometimes, a reverse discharge (RD) occurs during the PP, indicated by a reduction in plasma and floating potentials. RD is caused by secondary electrons from Ar+ ions and the magnetron&apos;s magnetic field configuration. RD can degrade the quality of the deposited film. The study focuses on how the magnetic field geometry affects RD during PP. Experiments were conducted with a titanium target and varied magnetic field configurations. Results showed that the delay between PP and RD decreases with a weaker outer magnetic field. A weaker inner magnetic field delays RD ignition, and in some cases, prevents it entirely. Optimizing magnetic field geometry can control RD formation during BP-HiPIMS.

Název v anglickém jazyce

Reverse discharge in bipolar HiPIMS and its dependence on magnetic field geometry

Popis výsledku anglicky

Bipolar high-power impulse magnetron sputtering (BP-HiPIMS) includes a positive voltage pulse (PP) after a negative voltage pulse (NP) to enhance film deposition. The positive pulse propels ions towards the substrate, increasing deposition rate and film hardness. Sometimes, a reverse discharge (RD) occurs during the PP, indicated by a reduction in plasma and floating potentials. RD is caused by secondary electrons from Ar+ ions and the magnetron&apos;s magnetic field configuration. RD can degrade the quality of the deposited film. The study focuses on how the magnetic field geometry affects RD during PP. Experiments were conducted with a titanium target and varied magnetic field configurations. Results showed that the delay between PP and RD decreases with a weaker outer magnetic field. A weaker inner magnetic field delays RD ignition, and in some cases, prevents it entirely. Optimizing magnetic field geometry can control RD formation during BP-HiPIMS.

Druh

O - Ostatní výsledky

CEP obor

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OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

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Návaznosti

S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2024

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů