A reverse discharge during positive voltage pulses in bipolar high-power impulse magnetron sputtering
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F24%3A43973141" target="_blank" >RIV/49777513:23520/24:43973141 - isvavai.cz</a>
Výsledek na webu
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DOI - Digital Object Identifier
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Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
A reverse discharge during positive voltage pulses in bipolar high-power impulse magnetron sputtering
Popis výsledku v původním jazyce
Bipolar high-power impulse magnetron sputtering (BP-HiPIMS) is characterized by applying a positive voltage pulse (PP) after a sputtering negative pulse (NP). This PP accelerates ions toward the substrate, enhancing deposition rate and film quality. However, the ignition of a reverse discharge (RD) during the PP can degrade the deposited films. Experiments showed that the delay between PP initiation and RD formation increases with a weaker inner magnetic field, while the effect is opposite for the outer magnetic field. The recorded anode light patterns confirmed the RD presence, emphasizing the importance of magnetic field geometry in controlling RD behavior during PP.
Název v anglickém jazyce
A reverse discharge during positive voltage pulses in bipolar high-power impulse magnetron sputtering
Popis výsledku anglicky
Bipolar high-power impulse magnetron sputtering (BP-HiPIMS) is characterized by applying a positive voltage pulse (PP) after a sputtering negative pulse (NP). This PP accelerates ions toward the substrate, enhancing deposition rate and film quality. However, the ignition of a reverse discharge (RD) during the PP can degrade the deposited films. Experiments showed that the delay between PP initiation and RD formation increases with a weaker inner magnetic field, while the effect is opposite for the outer magnetic field. The recorded anode light patterns confirmed the RD presence, emphasizing the importance of magnetic field geometry in controlling RD behavior during PP.
Klasifikace
Druh
O - Ostatní výsledky
CEP obor
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OECD FORD obor
10305 - Fluids and plasma physics (including surface physics)
Návaznosti výsledku
Projekt
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Návaznosti
S - Specificky vyzkum na vysokych skolach
Ostatní
Rok uplatnění
2024
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů