Rectangular magnetron with full target erosion

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F99%3A00039171" target="_blank" >RIV/49777513:23520/99:00039171 - isvavai.cz</a>

Výsledek na webu

—

DOI - Digital Object Identifier

—

Jazyk výsledku

angličtina

Název v původním jazyce

Rectangular magnetron with full target erosion

Popis výsledku v původním jazyce

The article reports on the operation of a rectangular magnetron with three and four closed discharges simultaneously formed on the surface of sputtered target. The closed discharges, elliptically shaped with the longer axis perpendicular to the long sideof the rectangular magnetron, are formed using magnetic circuits placed behind the sputtered target. By moving these magnetic circuits along the long axis of a rectangular target, it is possible to achieve almost full target erosion and therefore significantly increase the usage lifetime on the target. This principle can be used for rectangular magnetrons with arbitrary length of the target. The longer the target, the greater the number of closed discharges that are required. Experimentally, it was found that neighboring closed discharges can interact which may significantly modify the sputtering characteristics of the magnetron cathode. This interaction is described and the physical requirements to avoid its occurrence are given.

Název v anglickém jazyce

Rectangular magnetron with full target erosion

Popis výsledku anglicky

The article reports on the operation of a rectangular magnetron with three and four closed discharges simultaneously formed on the surface of sputtered target. The closed discharges, elliptically shaped with the longer axis perpendicular to the long sideof the rectangular magnetron, are formed using magnetic circuits placed behind the sputtered target. By moving these magnetic circuits along the long axis of a rectangular target, it is possible to achieve almost full target erosion and therefore significantly increase the usage lifetime on the target. This principle can be used for rectangular magnetrons with arbitrary length of the target. The longer the target, the greater the number of closed discharges that are required. Experimentally, it was found that neighboring closed discharges can interact which may significantly modify the sputtering characteristics of the magnetron cathode. This interaction is described and the physical requirements to avoid its occurrence are given.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

—

Projekt

<a href="/cs/project/GV106%2F96%2FK245" target="_blank" >GV106/96/K245: Tvrdé a supertvrdé povlaky vytvořené nekonvenčními plazmovými procesy</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

1999

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Vacuum Science and Technology

ISSN

07342101

e-ISSN

—

Svazek periodika

Vol.^A17

Číslo periodika v rámci svazku

č.^2

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

9

Strana od-do

—

Kód UT WoS článku

—

EID výsledku v databázi Scopus

—