Design of magnetic field configuration for controlled discharge properties in highly ionized plasma

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60076658%3A12310%2F15%3A43888690" target="_blank" >RIV/60076658:12310/15:43888690 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68378271:_____/15:00510804

Výsledek na webu

<a href="http://dx.doi.org/10.1088/0963-0252/24/4/045016" target="_blank" >http://dx.doi.org/10.1088/0963-0252/24/4/045016</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/0963-0252/24/4/045016" target="_blank" >10.1088/0963-0252/24/4/045016</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Design of magnetic field configuration for controlled discharge properties in highly ionized plasma

Popis výsledku v původním jazyce

In the present article, the effect of magnetic field design on electron and ion properties in both a metallic Ti/Ar and a reactive Ti/Ar + O-2 high power impulse magnetron sputtering (HiPIMS) discharges is investigated. For the purpose, a variable magnetron with defined imbalance and geometrical coefficients K and KG, respectively, was utilized. The electron density, the mean electron energy, the plasma potential, and the floating potential were determined by employing time-resolved Langmuir probe measurements, for four specified magnetic field configurations. Mass spectroscopy was used in order to determine the energy distribution function of metal (Ti+, Ti2+) and gaseous (Ar+, Ar2+, O+, O-2(+)) ions. Analysis of the measured data shows that the magnetic field design dramatically affects the charged particles energy- and spatial-distribution, causing a change in the plasma properties. It is concluded that a well-determined configuration of the magnetic field is necessary in order to i

Název v anglickém jazyce

Design of magnetic field configuration for controlled discharge properties in highly ionized plasma

Popis výsledku anglicky

In the present article, the effect of magnetic field design on electron and ion properties in both a metallic Ti/Ar and a reactive Ti/Ar + O-2 high power impulse magnetron sputtering (HiPIMS) discharges is investigated. For the purpose, a variable magnetron with defined imbalance and geometrical coefficients K and KG, respectively, was utilized. The electron density, the mean electron energy, the plasma potential, and the floating potential were determined by employing time-resolved Langmuir probe measurements, for four specified magnetic field configurations. Mass spectroscopy was used in order to determine the energy distribution function of metal (Ti+, Ti2+) and gaseous (Ar+, Ar2+, O+, O-2(+)) ions. Analysis of the measured data shows that the magnetic field design dramatically affects the charged particles energy- and spatial-distribution, causing a change in the plasma properties. It is concluded that a well-determined configuration of the magnetic field is necessary in order to i

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

<a href="/cs/project/GAP108%2F12%2F2104" target="_blank" >GAP108/12/2104: Pokročilé polovodičové materiály pro fotoelektrochemický rozklad vody</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2015

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Plasma Sources Science and Technology

ISSN

0963-0252

e-ISSN

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Svazek periodika

24

Číslo periodika v rámci svazku

4

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

10

Strana od-do

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Kód UT WoS článku

000364098900028

EID výsledku v databázi Scopus

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