Ag implantation into silicate glasses for optical applications

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F08%3A00020546" target="_blank" >RIV/60461373:22310/08:00020546 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Ag implantation into silicate glasses for optical applications

Popis výsledku v původním jazyce

Materials containing metal particles and clusters could be interesting for photonics applications. Recently, the ion implantation technique has been applied for doping of metal particles into glass substrates to change its linear and nonlinear propertiesin layers near the surface. In this work we present a systematic study of the Ag ion implantation into different types of silicate glasses ? both commercial and specially designed. The glasses differed in concentration and types of network elements (Si,Al and/or B) as well as monovalent (Na, K, Li) and divalent modificators (CaO, MgO and/or ZnO). The energy of the implanted Ag ions was 330 keV and used implantation fluency of ions was kept at 1.1016 ions.cm-2. The as-implanted samples were annealed inair at 600 °C for 5 hours. Diffusion profiles of the implanted Ag ions were measured by the Rutherford Backscattering Spectrometry. The UV-VIS spectra were measured to examine the desired absorption around 400 nm. The type and amount of

Název v anglickém jazyce

Ag implantation into silicate glasses for optical applications

Popis výsledku anglicky

Materials containing metal particles and clusters could be interesting for photonics applications. Recently, the ion implantation technique has been applied for doping of metal particles into glass substrates to change its linear and nonlinear propertiesin layers near the surface. In this work we present a systematic study of the Ag ion implantation into different types of silicate glasses ? both commercial and specially designed. The glasses differed in concentration and types of network elements (Si,Al and/or B) as well as monovalent (Na, K, Li) and divalent modificators (CaO, MgO and/or ZnO). The energy of the implanted Ag ions was 330 keV and used implantation fluency of ions was kept at 1.1016 ions.cm-2. The as-implanted samples were annealed inair at 600 °C for 5 hours. Diffusion profiles of the implanted Ag ions were measured by the Rutherford Backscattering Spectrometry. The UV-VIS spectra were measured to examine the desired absorption around 400 nm. The type and amount of

Druh

D - Stať ve sborníku

CEP obor

JJ - Ostatní materiály

OECD FORD obor

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Projekt

<a href="/cs/project/LC06041" target="_blank" >LC06041: Příprava, modifikace a charakterizace materiálů energetickým zářením</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2008

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

The 8th Conference on Solid State Chemistry, ,

ISBN

978-80-224-1019-9

ISSN

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e-ISSN

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Počet stran výsledku

1

Strana od-do

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Název nakladatele

Bratislava, Slovakia

Místo vydání

Bratislava, Slovakia

Místo konání akce

Bratislava, Slovakia

Datum konání akce

6. 7. 2008

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

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