Ablation of single-crystalline cesium iodide by extreme ultraviolet capillary-discharge laser

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F20%3A00538104" target="_blank" >RIV/61388955:_____/20:00538104 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68378271:_____/20:00535114 RIV/61389021:_____/20:00541066 RIV/00216208:11320/20:10420452 RIV/61989100:27200/20:10246242

Výsledek na webu

<a href="http://hdl.handle.net/11104/0315918" target="_blank" >http://hdl.handle.net/11104/0315918</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.2478/nuka-2020-0031" target="_blank" >10.2478/nuka-2020-0031</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Ablation of single-crystalline cesium iodide by extreme ultraviolet capillary-discharge laser

Popis výsledku v původním jazyce

Extreme ultraviolet (XUV) capillary-discharge lasers (CDLs) are a suitable source for the efficient, clean ablation of ionic crystals, which are obviously difficult to ablate with conventional, long-wavelength lasers. In the present study, a single crystal of cesium iodide (CsI) was irradiated by multiple, focused 1.5-ns pulses of 46.9-nm radiation delivered from a compact XUV-CDL device operated at either 2-Hz or 3-Hz repetition rates. The ablation rates were determined from the depth of the craters produced by the accumulation of laser pulses. Langmuir probes were used to diagnose the plasma plume produced by the focused XUV-CDL beam. Both the electron density and electron temperature were sufficiently high to confirm that ablation was the key process in the observed CsI removal. Moreover, a CsI thin film on MgO substrate was prepared by XUV pulsed laser deposition. A fraction of the film was detected by X-ray photoelectron spectroscopy.

Název v anglickém jazyce

Ablation of single-crystalline cesium iodide by extreme ultraviolet capillary-discharge laser

Popis výsledku anglicky

Extreme ultraviolet (XUV) capillary-discharge lasers (CDLs) are a suitable source for the efficient, clean ablation of ionic crystals, which are obviously difficult to ablate with conventional, long-wavelength lasers. In the present study, a single crystal of cesium iodide (CsI) was irradiated by multiple, focused 1.5-ns pulses of 46.9-nm radiation delivered from a compact XUV-CDL device operated at either 2-Hz or 3-Hz repetition rates. The ablation rates were determined from the depth of the craters produced by the accumulation of laser pulses. Langmuir probes were used to diagnose the plasma plume produced by the focused XUV-CDL beam. Both the electron density and electron temperature were sufficiently high to confirm that ablation was the key process in the observed CsI removal. Moreover, a CsI thin film on MgO substrate was prepared by XUV pulsed laser deposition. A fraction of the film was detected by X-ray photoelectron spectroscopy.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10403 - Physical chemistry

Projekt

<a href="/cs/project/GA19-00579S" target="_blank" >GA19-00579S: Pokročilá diagnostika reaktivního HiPIMS plazmatu pro depozici oxidových, nitridových a sulfidových vrstev</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2020

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Nukleonika

ISSN

0029-5922

e-ISSN

—

Svazek periodika

65

Číslo periodika v rámci svazku

4

Stát vydavatele periodika

PL - Polská republika

Počet stran výsledku

6

Strana od-do

205-210

Kód UT WoS článku

000582490100001

EID výsledku v databázi Scopus

2-s2.0-85096049178