Plasma chemistry during the deposition of a-C : H films and its influence on film properties.

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389005%3A_____%2F03%3A49033067" target="_blank" >RIV/61389005:_____/03:49033067 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Plasma chemistry during the deposition of a-C : H films and its influence on film properties.

Popis výsledku v původním jazyce

Plasma chemistry in an argon/acetylene expanding thermal plasma was studied by means of a residual gas analyser (RGA) and cavity ring down spectroscopy (CRDS). With RGA, the consumption of acetylene in the plasma and the production of the C4H2 molecule was measured. CRDS was used for C, CH and C-2 radical detection. It is demonstrated that C, CH and C-2 are products of a secondary reaction chain of argon ions and electrons with radical products formed after the primary reaction of argon ions and electrons with acetylene. By increasing the acetylene injection the composition of the plasma, and consequently the film properties, can be controlled. The growth of the films was monitored using in situ real time single wavelength ellipsometry. Films were analysed with Rutherford backscattering combined with elastic recoil detection analysis and with ex situ spectroscopic ellipsometry. The film properties reflect clearly the different plasma composition. Possible consequences for hydrogenated

Název v anglickém jazyce

Plasma chemistry during the deposition of a-C : H films and its influence on film properties.

Popis výsledku anglicky

Plasma chemistry in an argon/acetylene expanding thermal plasma was studied by means of a residual gas analyser (RGA) and cavity ring down spectroscopy (CRDS). With RGA, the consumption of acetylene in the plasma and the production of the C4H2 molecule was measured. CRDS was used for C, CH and C-2 radical detection. It is demonstrated that C, CH and C-2 are products of a secondary reaction chain of argon ions and electrons with radical products formed after the primary reaction of argon ions and electrons with acetylene. By increasing the acetylene injection the composition of the plasma, and consequently the film properties, can be controlled. The growth of the films was monitored using in situ real time single wavelength ellipsometry. Films were analysed with Rutherford backscattering combined with elastic recoil detection analysis and with ex situ spectroscopic ellipsometry. The film properties reflect clearly the different plasma composition. Possible consequences for hydrogenated

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2003

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

DIAMOND AND RELATED MATERIALS

ISSN

0925-9635

e-ISSN

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Svazek periodika

12

Číslo periodika v rámci svazku

2

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

8

Strana od-do

90-97

Kód UT WoS článku

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EID výsledku v databázi Scopus

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