Characterization of the Nanostructured Nickel Oxide Layers Prepared by Ion Beam Sputtering

Kód výsledku v IS VaVaI

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Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Characterization of the Nanostructured Nickel Oxide Layers Prepared by Ion Beam Sputtering

Popis výsledku v původním jazyce

Nanostructured nickel oxide layers (thickness cca 100 nm) were prepared by bombardment of nickel foil with ion beam created from a mixture of argon and oxygen. Different volume ratios of argon:oxygen mixture were used, ranging from 4:1 to 1:3. Composition of the resulting layers was analyzed by RBS, morphology by AFM and main crystal orientation of the sample by XRD. The electrophysical properties (resistivity, concentration of charge carriers) were measured by four point Van der Pauw technique and Hallmeasurement respectively. Prepared samples were characterized in as-deposited state and after annealing with varying temperature of treatment. Chemical composition (i.e. stoichiometry) of the as-deposited samples with different argon: oxygen ratio was related to their electrophysical parameters. Hall measurements are showing majority charge carriers to be electrons - surface concentration (0.5 - 2.3) x 10(21) m(-2) - suggesting prevailing metallic conductivity. Resistivity of the sample

Název v anglickém jazyce

Characterization of the Nanostructured Nickel Oxide Layers Prepared by Ion Beam Sputtering

Popis výsledku anglicky

Nanostructured nickel oxide layers (thickness cca 100 nm) were prepared by bombardment of nickel foil with ion beam created from a mixture of argon and oxygen. Different volume ratios of argon:oxygen mixture were used, ranging from 4:1 to 1:3. Composition of the resulting layers was analyzed by RBS, morphology by AFM and main crystal orientation of the sample by XRD. The electrophysical properties (resistivity, concentration of charge carriers) were measured by four point Van der Pauw technique and Hallmeasurement respectively. Prepared samples were characterized in as-deposited state and after annealing with varying temperature of treatment. Chemical composition (i.e. stoichiometry) of the as-deposited samples with different argon: oxygen ratio was related to their electrophysical parameters. Hall measurements are showing majority charge carriers to be electrons - surface concentration (0.5 - 2.3) x 10(21) m(-2) - suggesting prevailing metallic conductivity. Resistivity of the sample

Druh

D - Stať ve sborníku

CEP obor

BG - Jaderná, atomová a molekulová fyzika, urychlovače

OECD FORD obor

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Projekt

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Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2011

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

NANOCON 2011, Conference Proceedings, 3 rd International Conference

ISBN

978-80-87294-27-7

ISSN

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e-ISSN

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Počet stran výsledku

4

Strana od-do

674-677

Název nakladatele

TANGER Ltd., Ostrava

Místo vydání

Brno

Místo konání akce

Brno

Datum konání akce

21. 9. 2011

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

000306686700111