Implementation of MeV heavy-ion implantation into a microstructures with a defined pattern structure using a nuclear microprobe

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389005%3A_____%2F25%3A00645188" target="_blank" >RIV/61389005:_____/25:00645188 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/44555601:13440/25:43899424

Výsledek na webu

<a href="https://www.sciencedirect.com/science/article/pii/S0168583X25003106" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0168583X25003106</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.nimb.2025.165920" target="_blank" >10.1016/j.nimb.2025.165920</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Implementation of MeV heavy-ion implantation into a microstructures with a defined pattern structure using a nuclear microprobe

Popis výsledku v původním jazyce

Facilities equipped with electrostatic accelerators for ion beam analysis often perform high-energy ion beam implantation to dope target materials. A typical task of ion implantation is the uniform placement of ions over a large area using a wide-profile raster-scanned beam. Implantation of ions in a specific pattern (ion beam lithography) is also possible. However, this requires the use of masks, which are typically outsourced for production. Laboratories equipped with a nuclear microprobe can accomplish ion beam lithography without the need for masks, using the direct-write method, although the ion mass and energy may be limited by the magnetic rigidity of the microprobe focusing system. The aim of this work is to demonstrate the possibility of heavy ion lithography without the need for outsourced masks, using a nuclear microprobe as an auxiliary technique. The validity of the proposed method was established by implantation of 2.5 MeV gold ions into glass in a pattern with a minimum feature size of 3 mu m. The potential challenges of this method are described in detail. The most critical issue of this method is material incompatibility.

Název v anglickém jazyce

Implementation of MeV heavy-ion implantation into a microstructures with a defined pattern structure using a nuclear microprobe

Popis výsledku anglicky

Facilities equipped with electrostatic accelerators for ion beam analysis often perform high-energy ion beam implantation to dope target materials. A typical task of ion implantation is the uniform placement of ions over a large area using a wide-profile raster-scanned beam. Implantation of ions in a specific pattern (ion beam lithography) is also possible. However, this requires the use of masks, which are typically outsourced for production. Laboratories equipped with a nuclear microprobe can accomplish ion beam lithography without the need for masks, using the direct-write method, although the ion mass and energy may be limited by the magnetic rigidity of the microprobe focusing system. The aim of this work is to demonstrate the possibility of heavy ion lithography without the need for outsourced masks, using a nuclear microprobe as an auxiliary technique. The validity of the proposed method was established by implantation of 2.5 MeV gold ions into glass in a pattern with a minimum feature size of 3 mu m. The potential challenges of this method are described in detail. The most critical issue of this method is material incompatibility.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10301 - Atomic, molecular and chemical physics (physics of atoms and molecules including collision, interaction with radiation, magnetic resonances, Mössbauer effect)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2025

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Nuclear Instruments & Methods in Physics Research Section B

ISSN

0168-583X

e-ISSN

1872-9584

Svazek periodika

569

Číslo periodika v rámci svazku

December

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

6

Strana od-do

165920

Kód UT WoS článku

001661145400001

EID výsledku v databázi Scopus

2-s2.0-105020012470