Influence of Deposition Time on Titanium Nitride (TiN) Thin Film Coating Synthesis Using Chemical Vapour Deposition

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989100%3A27230%2F23%3A10252699" target="_blank" >RIV/61989100:27230/23:10252699 - isvavai.cz</a>

Výsledek na webu

<a href="https://www.webofscience.com/wos/woscc/full-record/WOS:001032293700001" target="_blank" >https://www.webofscience.com/wos/woscc/full-record/WOS:001032293700001</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.3390/ma16134611" target="_blank" >10.3390/ma16134611</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Influence of Deposition Time on Titanium Nitride (TiN) Thin Film Coating Synthesis Using Chemical Vapour Deposition

Popis výsledku v původním jazyce

Titanium nitride (TiN) thin film coatings were grown over silicon (p-type) substrate using the atmospheric pressure chemical vapour deposition (APCVD) technique. The synthesis process was carried out to evaluate the effect of deposition time on the physical and mechanical characteristics of TiN coating. Thin films grown over Si substrate were further characterised to evaluate the morphological properties, surface roughness and mechanical properties using a scanning electrode microscope (SEM), atomic force microscopy (AFM) and nanoindentation, respectively. EDS equipped with SEM showed the presence of Ti and N elements in considerable amounts. TiN morphology obtained from the SEM test showed small-sized particles on the surface along with cracks and pores. AFM results revealed that by increasing the deposition time, the surface roughness of the coating also increased. The nanomechanical properties such as nanohardness (H) and Young&apos;s modulus (E), etc., evaluated using the nanoindentation technique showed that higher deposition time led to an increase in H and E. Overall, it was observed that deposition time plays a vital role in the TiN coating deposition using the CVD technique.

Název v anglickém jazyce

Influence of Deposition Time on Titanium Nitride (TiN) Thin Film Coating Synthesis Using Chemical Vapour Deposition

Popis výsledku anglicky

Titanium nitride (TiN) thin film coatings were grown over silicon (p-type) substrate using the atmospheric pressure chemical vapour deposition (APCVD) technique. The synthesis process was carried out to evaluate the effect of deposition time on the physical and mechanical characteristics of TiN coating. Thin films grown over Si substrate were further characterised to evaluate the morphological properties, surface roughness and mechanical properties using a scanning electrode microscope (SEM), atomic force microscopy (AFM) and nanoindentation, respectively. EDS equipped with SEM showed the presence of Ti and N elements in considerable amounts. TiN morphology obtained from the SEM test showed small-sized particles on the surface along with cracks and pores. AFM results revealed that by increasing the deposition time, the surface roughness of the coating also increased. The nanomechanical properties such as nanohardness (H) and Young&apos;s modulus (E), etc., evaluated using the nanoindentation technique showed that higher deposition time led to an increase in H and E. Overall, it was observed that deposition time plays a vital role in the TiN coating deposition using the CVD technique.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20300 - Mechanical engineering

Projekt

—

Návaznosti

S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2023

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Materials

ISSN

1996-1944

e-ISSN

—

Svazek periodika

16

Číslo periodika v rámci svazku

13

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

13

Strana od-do

—

Kód UT WoS článku

001032293700001

EID výsledku v databázi Scopus

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