Analysis and modeling of depolarization effects in Mueller matrix spectroscopic ellipsometry data

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989100%3A27640%2F16%3A86098473" target="_blank" >RIV/61989100:27640/16:86098473 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.mspro.2016.03.020" target="_blank" >http://dx.doi.org/10.1016/j.mspro.2016.03.020</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.mspro.2016.03.020" target="_blank" >10.1016/j.mspro.2016.03.020</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Analysis and modeling of depolarization effects in Mueller matrix spectroscopic ellipsometry data

Popis výsledku v původním jazyce

In this paper we present importance of depolarization effects modeling to fit spectroscopic Mueller matrix ellipsometry data. The relevant theoretical background based on Mueller matrix formalism is presented. The sample of SiO2 layer (approx. 1 mu m thick) on silicon substrate is used to demonstrate depolarization effects in obtained experimental data. In the first step the presence of interferences in the layer is used for modeling of depolarization effects caused by finite spectral resolution of the Mueller matrix ellipsometer. In the next step the depolarization caused by focusing of the probe light is analyzed and modeled. Both finite spectral resolution and beam focusing is a common issue in the optical characterization of samples with lateral dimensions smaller than (commonly used) collimated beam. Therefore to fit experimental data with model it is important to assume those depolarization effect into model. (C) 2016 The Authors. Published by Elsevier Ltd.

Název v anglickém jazyce

Analysis and modeling of depolarization effects in Mueller matrix spectroscopic ellipsometry data

Popis výsledku anglicky

In this paper we present importance of depolarization effects modeling to fit spectroscopic Mueller matrix ellipsometry data. The relevant theoretical background based on Mueller matrix formalism is presented. The sample of SiO2 layer (approx. 1 mu m thick) on silicon substrate is used to demonstrate depolarization effects in obtained experimental data. In the first step the presence of interferences in the layer is used for modeling of depolarization effects caused by finite spectral resolution of the Mueller matrix ellipsometer. In the next step the depolarization caused by focusing of the probe light is analyzed and modeled. Both finite spectral resolution and beam focusing is a common issue in the optical characterization of samples with lateral dimensions smaller than (commonly used) collimated beam. Therefore to fit experimental data with model it is important to assume those depolarization effect into model. (C) 2016 The Authors. Published by Elsevier Ltd.

Druh

D - Stať ve sborníku

CEP obor

BH - Optika, masery a lasery

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2016

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

Procedia Materials Science. Volume 12

ISBN

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ISSN

2211-8128

e-ISSN

—

Počet stran výsledku

6

Strana od-do

112-117

Název nakladatele

Elsevier

Místo vydání

Amsterdam

Místo konání akce

Ostrava

Datum konání akce

8. 9. 2014

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

000386622900020