In-situ Mueller matrix ellipsometry of silicon nanowires grown by plasma-enhanced vapor-liquid-solid method for radial junction solar cells

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989100%3A27640%2F17%3A10236967" target="_blank" >RIV/61989100:27640/17:10236967 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/61989100:27740/17:10236967

Výsledek na webu

<a href="https://ac.els-cdn.com/S0169433216329312/1-s2.0-S0169433216329312-main.pdf?_tid=d1aa9fc0-fb8e-11e7-b243-00000aacb35f&acdnat=1516197828_27d891081ea7385821a0b24a55893424" target="_blank" >https://ac.els-cdn.com/S0169433216329312/1-s2.0-S0169433216329312-main.pdf?_tid=d1aa9fc0-fb8e-11e7-b243-00000aacb35f&acdnat=1516197828_27d891081ea7385821a0b24a55893424</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.apsusc.2016.12.199" target="_blank" >10.1016/j.apsusc.2016.12.199</a>

Jazyk výsledku

angličtina

Název v původním jazyce

In-situ Mueller matrix ellipsometry of silicon nanowires grown by plasma-enhanced vapor-liquid-solid method for radial junction solar cells

Popis výsledku v původním jazyce

In-situ Mueller matrix spectroscopic ellipsometry was applied for monitoring the silicon nanowire growth by plasma-enhanced vapor-liquid-solid method. The technique is proposed as a real-time, non-destructive, and non-invasive characterization of the deposition process in a plasma-enhanced chemical vapor deposition reactor. The data have been taken by spectrally resolved Mueller matrix ellipsometer every 1 min during the 8-10 min long nanowire growth process. We have developed an easy-to-apply optical model to fit the experimental data, which enables to study the evolution of the parameters of the structure during initial stages of the growth. The first results provide information about the effective deposition rate determined from the linear increase of the deposited silicon volume with the deposition time.

Název v anglickém jazyce

In-situ Mueller matrix ellipsometry of silicon nanowires grown by plasma-enhanced vapor-liquid-solid method for radial junction solar cells

Popis výsledku anglicky

In-situ Mueller matrix spectroscopic ellipsometry was applied for monitoring the silicon nanowire growth by plasma-enhanced vapor-liquid-solid method. The technique is proposed as a real-time, non-destructive, and non-invasive characterization of the deposition process in a plasma-enhanced chemical vapor deposition reactor. The data have been taken by spectrally resolved Mueller matrix ellipsometer every 1 min during the 8-10 min long nanowire growth process. We have developed an easy-to-apply optical model to fit the experimental data, which enables to study the evolution of the parameters of the structure during initial stages of the growth. The first results provide information about the effective deposition rate determined from the linear increase of the deposited silicon volume with the deposition time.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10306 - Optics (including laser optics and quantum optics)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2017

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Applied Surface Science

ISSN

0169-4332

e-ISSN

—

Svazek periodika

421

Číslo periodika v rámci svazku

1 November 2017

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

7

Strana od-do

667-673

Kód UT WoS článku

000408756700063

EID výsledku v databázi Scopus

2-s2.0-85012022755