Influence of Feature Size, Film Thickness, and Silicon Doping on the Performance of Nanostructured Hematite Photoanodes for Solar Water Splitting

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989592%3A15310%2F09%3A00010457" target="_blank" >RIV/61989592:15310/09:00010457 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Influence of Feature Size, Film Thickness, and Silicon Doping on the Performance of Nanostructured Hematite Photoanodes for Solar Water Splitting

Popis výsledku v původním jazyce

Photoanodes consisting of nanostructured hematite prepared by atmospheric pressure chemical vapor deposition (APCVD) have previously set a benchmark for solar water splitting. Here, we fully investigate this promising system by varying critical syntheticparameters and probing the photoanode performance to determine the major factors that influence operation. By varying the film thickness, we show film growth to be linear with an incubation time. We find no concern with electron transport for films up to 600 nm, but a higher recombination rate of photogenerated carriers in the hematite near the interface with the fluorine-doped tin oxide, as compared to the bulk section of the film. The mechanism for the formation of the thin film?s nanoporous dendritic structure is discussed on the basis of the results from varying the substrate growth temperate. The observed feature sizes of the film are found to depend strongly on this temperature and the presence of silicon dopant precursor (TEOS).

Název v anglickém jazyce

Influence of Feature Size, Film Thickness, and Silicon Doping on the Performance of Nanostructured Hematite Photoanodes for Solar Water Splitting

Popis výsledku anglicky

Photoanodes consisting of nanostructured hematite prepared by atmospheric pressure chemical vapor deposition (APCVD) have previously set a benchmark for solar water splitting. Here, we fully investigate this promising system by varying critical syntheticparameters and probing the photoanode performance to determine the major factors that influence operation. By varying the film thickness, we show film growth to be linear with an incubation time. We find no concern with electron transport for films up to 600 nm, but a higher recombination rate of photogenerated carriers in the hematite near the interface with the fluorine-doped tin oxide, as compared to the bulk section of the film. The mechanism for the formation of the thin film?s nanoporous dendritic structure is discussed on the basis of the results from varying the substrate growth temperate. The observed feature sizes of the film are found to depend strongly on this temperature and the presence of silicon dopant precursor (TEOS).

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

CF - Fyzikální chemie a teoretická chemie

OECD FORD obor

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Projekt

<a href="/cs/project/1M0512" target="_blank" >1M0512: Centrrum výzkumu práškových nanomateriálů</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2009

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Physical Chemistry Part C: Nanomaterials and Interfaces

ISSN

1932-7447

e-ISSN

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Svazek periodika

113

Číslo periodika v rámci svazku

2

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

11

Strana od-do

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Kód UT WoS článku

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EID výsledku v databázi Scopus

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