Physical Characterization of Hafnium Oxide Thin Films Annealed in Vacuum

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989592%3A15310%2F18%3A73590550" target="_blank" >RIV/61989592:15310/18:73590550 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.4028/www.scientific.net/KEM.784.135" target="_blank" >http://dx.doi.org/10.4028/www.scientific.net/KEM.784.135</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.4028/www.scientific.net/KEM.784.135" target="_blank" >10.4028/www.scientific.net/KEM.784.135</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Physical Characterization of Hafnium Oxide Thin Films Annealed in Vacuum

Popis výsledku v původním jazyce

Hafnium oxide (HfO2) is a material characterized by a good mechanical, thermal and chemical stability and is used as a material in a variety of technological applications in optics and electronics. In this work the influence of annealing temperature on the mechanical structural properties of amorphous HfO2 thin film was explored. Films were deposited by electron beam evaporation and annealed in the temperature range from 200 °C to 500 °C in vacuum. Mechanical properties such as hardness and elastic modulus were determined using nanoindentation, while cohesive-adhesive properties of the film using a scratch test. Surface morphology was determined using a confocal microscope and structure using XRD. The transformation of amorphous phase of the films to the nanocrystalline monoclinic phase was observed after vacuum annealing at 500 °C. This crystallization leads to increase in hardness on one hand but also to growth of brittleness and in turn to decrease in scratch resistance on the other hand.

Název v anglickém jazyce

Physical Characterization of Hafnium Oxide Thin Films Annealed in Vacuum

Popis výsledku anglicky

Hafnium oxide (HfO2) is a material characterized by a good mechanical, thermal and chemical stability and is used as a material in a variety of technological applications in optics and electronics. In this work the influence of annealing temperature on the mechanical structural properties of amorphous HfO2 thin film was explored. Films were deposited by electron beam evaporation and annealed in the temperature range from 200 °C to 500 °C in vacuum. Mechanical properties such as hardness and elastic modulus were determined using nanoindentation, while cohesive-adhesive properties of the film using a scratch test. Surface morphology was determined using a confocal microscope and structure using XRD. The transformation of amorphous phase of the films to the nanocrystalline monoclinic phase was observed after vacuum annealing at 500 °C. This crystallization leads to increase in hardness on one hand but also to growth of brittleness and in turn to decrease in scratch resistance on the other hand.

Druh

D - Stať ve sborníku

CEP obor

—

OECD FORD obor

10306 - Optics (including laser optics and quantum optics)

Projekt

<a href="/cs/project/LO1305" target="_blank" >LO1305: Rozvoj centra pokročilých technologií a materiálů</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2018

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

Local Mechanical Properties XIII

ISBN

—

ISSN

1013-9826

e-ISSN

1662-9795

Počet stran výsledku

6

Strana od-do

135-140

Název nakladatele

Trans Tech Publications Ltd

Místo vydání

Zurich

Místo konání akce

Košice

Datum konání akce

6. 11. 2017

Typ akce podle státní příslušnosti

EUR - Evropská akce

Kód UT WoS článku

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