Application of pressurized hot water for etching of microfluidics

Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081715%3A_____%2F13%3A00437327" target="_blank" >RIV/68081715:_____/13:00437327 - isvavai.cz</a>
Výsledek na webu
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DOI - Digital Object Identifier
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Jazyk výsledku
angličtina
Název v původním jazyce
Application of pressurized hot water for etching of microfluidics
Popis výsledku v původním jazyce
The subject of this study is a new method of glass etching and its application in microfluidics. Commonly, hydrofluoric acid is used for glass etching. In this study we have tested a new method of glass etching using pressurized hot water. Test motives were prepared using photolitography and metal sputtering on the glass substrate and the etching was performed in a newly developed device capable to compress and heat water to its critical point. Electron microscopy and profilometry have been used for analyzing the surface of the etched glass substrate.
Název v anglickém jazyce
Application of pressurized hot water for etching of microfluidics
Popis výsledku anglicky
The subject of this study is a new method of glass etching and its application in microfluidics. Commonly, hydrofluoric acid is used for glass etching. In this study we have tested a new method of glass etching using pressurized hot water. Test motives were prepared using photolitography and metal sputtering on the glass substrate and the etching was performed in a newly developed device capable to compress and heat water to its critical point. Electron microscopy and profilometry have been used for analyzing the surface of the etched glass substrate.

Projekt
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Návaznosti
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění
2013
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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