E-beam Nano-patterning for Electroforming Replication

Kód výsledku v IS VaVaI

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Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

E-beam Nano-patterning for Electroforming Replication

Popis výsledku v původním jazyce

This contribution deals with nano-patterning by the way of electron beam lithography with satisfying requirements for electroforming replication of desired patterns. Electron beam lithography can be used for creating nano graphics (images, text etc.) dueto its very high resolution and precision. However, patterns created by electron beam lithography cannot be applied for mass production directly because of resist material soft nature (usually a polymer material). Because of that, hard printing plate must be produced. Nickel plate prepared by electroforming is one of the ways to accomplish that. Prior to the production of nickel plate by electroforming, the surface of polymer material has to be covered by a sufficiently thick layer of metal. This procedure can lead to a partial destruction of the motif (completely covered by metal) thus the decreasing of nano graphics resolution. In this paper several nano graphics (images and text with various resolutions) are prepared in positive res

Název v anglickém jazyce

E-beam Nano-patterning for Electroforming Replication

Popis výsledku anglicky

This contribution deals with nano-patterning by the way of electron beam lithography with satisfying requirements for electroforming replication of desired patterns. Electron beam lithography can be used for creating nano graphics (images, text etc.) dueto its very high resolution and precision. However, patterns created by electron beam lithography cannot be applied for mass production directly because of resist material soft nature (usually a polymer material). Because of that, hard printing plate must be produced. Nickel plate prepared by electroforming is one of the ways to accomplish that. Prior to the production of nickel plate by electroforming, the surface of polymer material has to be covered by a sufficiently thick layer of metal. This procedure can lead to a partial destruction of the motif (completely covered by metal) thus the decreasing of nano graphics resolution. In this paper several nano graphics (images and text with various resolutions) are prepared in positive res

Druh

D - Stať ve sborníku

CEP obor

BH - Optika, masery a lasery

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

NANOCON 2014. 6th International conference proceedings

ISBN

978-80-87294-55-0

ISSN

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e-ISSN

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Počet stran výsledku

6

Strana od-do

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Název nakladatele

TANGER

Místo vydání

Ostrava

Místo konání akce

Brno

Datum konání akce

5. 11. 2014

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

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