Low-emittance copper-coating system using atomic-layer-deposited aluminum oxide

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F22%3A00557634" target="_blank" >RIV/68081731:_____/22:00557634 - isvavai.cz</a>

Výsledek na webu

<a href="https://www.sciencedirect.com/science/article/pii/S0040609022000992" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0040609022000992</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.tsf.2022.139179" target="_blank" >10.1016/j.tsf.2022.139179</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Low-emittance copper-coating system using atomic-layer-deposited aluminum oxide

Popis výsledku v původním jazyce

Copper, due to its unique properties, has a huge technological importance to our society. However, the oxidation of copper remains an issue in numerous application areas. This is especially the case in visible and IR-band optics, where even minuscule oxide layers degrade the thermo-optical properties of copper surfaces. A solution possibly resides in the application of protective coatings, which can simultaneously impair the low thermal emittance of bare copper surfaces. The present paper examines the use of thin Al2O3 layers as a protective coating for copper. Al2O3 layers with thickness of 4.5, 9.1, 18.5 or 28.3 nm were deposited on polished copper discs using atomic layer deposition (ALD). The total hemispherical emissivity and absorptivity of these coated copper discs were measured from 20 K up to room temperature. The emissivity and absorptivity of the copper with ALD-deposited Al2O3 layers increased with rising temperature and layer thickness. Nonetheless, the observed values stayed below 1.8%, allowing the use of the coated copper in systems where low emission or absorption of thermal radiation is needed. Alongside the experiments, we present a computer-based analysis and interpretation, which may be generally applied for prediction of temperature-dependent emittance of metallic surfaces coated with a thin polar dielectric layer.

Název v anglickém jazyce

Low-emittance copper-coating system using atomic-layer-deposited aluminum oxide

Popis výsledku anglicky

Copper, due to its unique properties, has a huge technological importance to our society. However, the oxidation of copper remains an issue in numerous application areas. This is especially the case in visible and IR-band optics, where even minuscule oxide layers degrade the thermo-optical properties of copper surfaces. A solution possibly resides in the application of protective coatings, which can simultaneously impair the low thermal emittance of bare copper surfaces. The present paper examines the use of thin Al2O3 layers as a protective coating for copper. Al2O3 layers with thickness of 4.5, 9.1, 18.5 or 28.3 nm were deposited on polished copper discs using atomic layer deposition (ALD). The total hemispherical emissivity and absorptivity of these coated copper discs were measured from 20 K up to room temperature. The emissivity and absorptivity of the copper with ALD-deposited Al2O3 layers increased with rising temperature and layer thickness. Nonetheless, the observed values stayed below 1.8%, allowing the use of the coated copper in systems where low emission or absorption of thermal radiation is needed. Alongside the experiments, we present a computer-based analysis and interpretation, which may be generally applied for prediction of temperature-dependent emittance of metallic surfaces coated with a thin polar dielectric layer.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20303 - Thermodynamics

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2022

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Thin Solid Films

ISSN

0040-6090

e-ISSN

1879-2731

Svazek periodika

749

Číslo periodika v rámci svazku

1 May

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

9

Strana od-do

139179

Kód UT WoS článku

000791327600003

EID výsledku v databázi Scopus

2-s2.0-85127030076