Novel high frequency pulsed MW-linear antenna plasma-chemistry: Routes towards large area, low pressure nanodiamond growth

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F11%3A00361471" target="_blank" >RIV/68378271:_____/11:00361471 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68407700:21460/11:00183546

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.diamond.2011.01.003" target="_blank" >http://dx.doi.org/10.1016/j.diamond.2011.01.003</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.diamond.2011.01.003" target="_blank" >10.1016/j.diamond.2011.01.003</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Novel high frequency pulsed MW-linear antenna plasma-chemistry: Routes towards large area, low pressure nanodiamond growth

Popis výsledku v původním jazyce

Current experimental microwave plasma enhanced chemical vapour deposition (MW PECVD) concepts for diamond thin films do not allow scaling up toward large areas, which is essential for microelectronic industries. Also, current growth temperatures are rather high and not compatible with processing technologies. In the current work we demonstrate a breakthrough concept using a high frequency (HF) pulsed MW-linear antenna plasma configuration, allowing a scalable concept. By using HF pulses non-linear MW absorption conditions are reached, allowing a reduction of input power to 4 W/cm2 compared with typically 100-200 W/cm2 for resonance cavity applicators. Despite the factor of 50 power reduction, the growth rate obtained at 450°C is comparable to or higherthan that of resonance cavity systems. Our concept is a significant improvement as compared to [1 & 3] previous methods of nanodiamond growth. The resulting diamond films show columnar growth, i.e. resembling classical NCD.

Název v anglickém jazyce

Novel high frequency pulsed MW-linear antenna plasma-chemistry: Routes towards large area, low pressure nanodiamond growth

Popis výsledku anglicky

Current experimental microwave plasma enhanced chemical vapour deposition (MW PECVD) concepts for diamond thin films do not allow scaling up toward large areas, which is essential for microelectronic industries. Also, current growth temperatures are rather high and not compatible with processing technologies. In the current work we demonstrate a breakthrough concept using a high frequency (HF) pulsed MW-linear antenna plasma configuration, allowing a scalable concept. By using HF pulses non-linear MW absorption conditions are reached, allowing a reduction of input power to 4 W/cm2 compared with typically 100-200 W/cm2 for resonance cavity applicators. Despite the factor of 50 power reduction, the growth rate obtained at 450°C is comparable to or higherthan that of resonance cavity systems. Our concept is a significant improvement as compared to [1 & 3] previous methods of nanodiamond growth. The resulting diamond films show columnar growth, i.e. resembling classical NCD.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

—

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2011

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Diamond and Related Materials

ISSN

0925-9635

e-ISSN

—

Svazek periodika

20

Číslo periodika v rámci svazku

4

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

3

Strana od-do

613-615

Kód UT WoS článku

000291140200032

EID výsledku v databázi Scopus

—