Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering

Kód výsledku v IS VaVaI

RIV/68378271:_____/12:00377074 - isvavai.cz

Nalezeny alternativní kódy

RIV/00216208:11320/12:10130572

Výsledek na webu

http://dx.doi.org/10.1016/j.surfcoat.2011.11.043

DOI - Digital Object Identifier

10.1016/j.surfcoat.2011.11.043

Jazyk výsledku

angličtina

Název v původním jazyce

Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering

Popis výsledku v původním jazyce

The present paper is focused on time-resolved diagnostics of the simultaneous combination of dual mid frequency and dual-high power impulse magnetron sputtering discharges (so-called hybrid-dual-HiPIMS systems). The magnetrons in dual configuration are electrically confined, i.e. electrodes are alternately operated as an anode?cathode (and vice versa) during the sputtering. The dual MF discharge causes a pre-ionization effect which is an important feature because of: (i) a significant reduction of the working pressure by more than one order of magnitude, (ii) an increase of electron and ion energy, and (iii) an increase of the deposition rate. The time-resolved IVDF measurements revealed that ions with high energy generated at the cathode arrive at thesubstrate position about 25?30 ?s after the HiPIMS pulse ignition. The effect of the hybrid system is illustrated on the deposition of Ti?Cu films.

Název v anglickém jazyce

Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering

Popis výsledku anglicky

The present paper is focused on time-resolved diagnostics of the simultaneous combination of dual mid frequency and dual-high power impulse magnetron sputtering discharges (so-called hybrid-dual-HiPIMS systems). The magnetrons in dual configuration are electrically confined, i.e. electrodes are alternately operated as an anode?cathode (and vice versa) during the sputtering. The dual MF discharge causes a pre-ionization effect which is an important feature because of: (i) a significant reduction of the working pressure by more than one order of magnitude, (ii) an increase of electron and ion energy, and (iii) an increase of the deposition rate. The time-resolved IVDF measurements revealed that ions with high energy generated at the cathode arrive at thesubstrate position about 25?30 ?s after the HiPIMS pulse ignition. The effect of the hybrid system is illustrated on the deposition of Ti?Cu films.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2012

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

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Svazek periodika

206

Číslo periodika v rámci svazku

11-12

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

9

Strana od-do

2801-2809

Kód UT WoS článku

000301017300010

EID výsledku v databázi Scopus

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