Time-resolved diagnostics of dual high power impulse magnetron sputtering with pulse delays of 15 ?s and 500 ?s

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F11%3A00359582" target="_blank" >RIV/68378271:_____/11:00359582 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1002/ctpp.201000065" target="_blank" >http://dx.doi.org/10.1002/ctpp.201000065</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1002/ctpp.201000065" target="_blank" >10.1002/ctpp.201000065</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Time-resolved diagnostics of dual high power impulse magnetron sputtering with pulse delays of 15 ?s and 500 ?s

Popis výsledku v původním jazyce

Time-resolved measurements have been performed during dual High Power Impulse Magnetron Sputtering (dual-HiPIMS) with two cathodes in a closed magnetic field configuration. The effect of a delay between subsequent pulses on electron density, mean electron energy, and ion flux to the substrate was investigated by time-resolved diagnostic methods. Two different delays of 15 ?s and 500 ?s between subsequent pulses were investigated. The dual-HiPIMS system, operated at a repetition frequency f = 100 Hz andduty cycle of 1 %, was equipped with different metallic targets (Ti, Cu). It is shown that a delay between subsequent pulses influences the plasma parameters and can be used to control deposition processes. It was noted that target surfaces (alternatelyserving as a cathode/anode) are contaminated by sputtered material from the previous pulse which influences the time-evolution of the discharge parameters.

Název v anglickém jazyce

Time-resolved diagnostics of dual high power impulse magnetron sputtering with pulse delays of 15 ?s and 500 ?s

Popis výsledku anglicky

Time-resolved measurements have been performed during dual High Power Impulse Magnetron Sputtering (dual-HiPIMS) with two cathodes in a closed magnetic field configuration. The effect of a delay between subsequent pulses on electron density, mean electron energy, and ion flux to the substrate was investigated by time-resolved diagnostic methods. Two different delays of 15 ?s and 500 ?s between subsequent pulses were investigated. The dual-HiPIMS system, operated at a repetition frequency f = 100 Hz andduty cycle of 1 %, was equipped with different metallic targets (Ti, Cu). It is shown that a delay between subsequent pulses influences the plasma parameters and can be used to control deposition processes. It was noted that target surfaces (alternatelyserving as a cathode/anode) are contaminated by sputtered material from the previous pulse which influences the time-evolution of the discharge parameters.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BH - Optika, masery a lasery

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2011

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Contributions to Plasma Physics

ISSN

0863-1042

e-ISSN

—

Svazek periodika

51

Číslo periodika v rámci svazku

2

Stát vydavatele periodika

DE - Spolková republika Německo

Počet stran výsledku

9

Strana od-do

237-245

Kód UT WoS článku

000288610800020

EID výsledku v databázi Scopus

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