Review of nanocrystalline diamond film deposition on silicon and glass substrates down to 400 °C

Kód výsledku v IS VaVaI

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Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Review of nanocrystalline diamond film deposition on silicon and glass substrates down to 400 °C

Popis výsledku v původním jazyce

We present an overview of a nanocrystalline diamond (NCD) films deposition on silicon and glass substrates by microwave plasma CVD in hydrogen-based gas mixture. The temperature plays a crucial parameter as the diamond growth process is temperature controlled. Use of temperature sensitive substrates demanded reducing substrate temperature. Natural decrease of deposition rate resulted in search of new or nonstandard process parameters which could at least minimize or compensate it. Addition of oxygen containing gasses was found to improve film quality, and increasing deposition speed. Moreover improvement in pre-treatment of foreign substrates allowed deposition of fully closed films in less then 100 nm. Low thickness of NCD always favorable due to lattice mismatch between substrate material and NCD film. Successful adoption of NCD film deposition on silicon and glass allowed us to study surface chemical modification for protein attachment and DNA immobilization.

Název v anglickém jazyce

Review of nanocrystalline diamond film deposition on silicon and glass substrates down to 400 °C

Popis výsledku anglicky

We present an overview of a nanocrystalline diamond (NCD) films deposition on silicon and glass substrates by microwave plasma CVD in hydrogen-based gas mixture. The temperature plays a crucial parameter as the diamond growth process is temperature controlled. Use of temperature sensitive substrates demanded reducing substrate temperature. Natural decrease of deposition rate resulted in search of new or nonstandard process parameters which could at least minimize or compensate it. Addition of oxygen containing gasses was found to improve film quality, and increasing deposition speed. Moreover improvement in pre-treatment of foreign substrates allowed deposition of fully closed films in less then 100 nm. Low thickness of NCD always favorable due to lattice mismatch between substrate material and NCD film. Successful adoption of NCD film deposition on silicon and glass allowed us to study surface chemical modification for protein attachment and DNA immobilization.

Druh

D - Stať ve sborníku

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2012

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

Potential and applications of surface nanotreatment of polymers and glass 2012 - Book of extended abstracts

ISBN

978-80-210-5979-5

ISSN

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e-ISSN

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Počet stran výsledku

5

Strana od-do

82-86

Název nakladatele

Masarykova univerzita

Místo vydání

Brno

Místo konání akce

Brno

Datum konání akce

15. 10. 2012

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

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