Investigation of reactive HiPIMS + MF sputtering of TiO2 crystalline thin films

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F13%3A00422122" target="_blank" >RIV/68378271:_____/13:00422122 - isvavai.cz</a>

Výsledek na webu

<a href="http://www.sciencedirect.com/science/article/pii/S0257897213004829" target="_blank" >http://www.sciencedirect.com/science/article/pii/S0257897213004829</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2013.05.038" target="_blank" >10.1016/j.surfcoat.2013.05.038</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Investigation of reactive HiPIMS + MF sputtering of TiO2 crystalline thin films

Popis výsledku v původním jazyce

A hybrid high-power impulse magnetron sputtering (HiPIMS) + mid-frequency (MF) magnetron sputtering system was used for the deposition of crystalline TiO2 thin films at a low substrate temperature. Ion velocity distribution functions were measured in a pulsed magnetron discharge at substrate positions depending on the type of plasma excitation and on theworking gasmixtures. Several different pulsed discharge configurations were used: (i) HiPIMS, (ii) pulsed bipolar MF with frequency 350 kHz and (iii) both HiPIMS + MF connected in parallel to themagnetron cathode. Ti targets were sputtered in three different types of atmospheres: (i) inert pure Ar, (ii) a reactive mixture of Ar + O2 and (iii) a reactive mixture of Ar + O2 + N2 with a constant gas pressure p = 1 Pa. All IVDFs were measured using a time-resolved retarding field energy analyzer (RFEA) located in the substrate position. The thin film properties are discussed with respect to the measured plasma parameters.

Název v anglickém jazyce

Investigation of reactive HiPIMS + MF sputtering of TiO2 crystalline thin films

Popis výsledku anglicky

A hybrid high-power impulse magnetron sputtering (HiPIMS) + mid-frequency (MF) magnetron sputtering system was used for the deposition of crystalline TiO2 thin films at a low substrate temperature. Ion velocity distribution functions were measured in a pulsed magnetron discharge at substrate positions depending on the type of plasma excitation and on theworking gasmixtures. Several different pulsed discharge configurations were used: (i) HiPIMS, (ii) pulsed bipolar MF with frequency 350 kHz and (iii) both HiPIMS + MF connected in parallel to themagnetron cathode. Ti targets were sputtered in three different types of atmospheres: (i) inert pure Ar, (ii) a reactive mixture of Ar + O2 and (iii) a reactive mixture of Ar + O2 + N2 with a constant gas pressure p = 1 Pa. All IVDFs were measured using a time-resolved retarding field energy analyzer (RFEA) located in the substrate position. The thin film properties are discussed with respect to the measured plasma parameters.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2013

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

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Svazek periodika

232

Číslo periodika v rámci svazku

OCT

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

8

Strana od-do

376-383

Kód UT WoS článku

000327691300050

EID výsledku v databázi Scopus

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