ZnO thin films prepared by surfatron produced discharge
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F14%3A00430438" target="_blank" >RIV/68378271:_____/14:00430438 - isvavai.cz</a>
Nalezeny alternativní kódy
RIV/00216208:11320/14:10271629 RIV/61989592:15310/14:33149482 RIV/60461373:22310/14:43898414
Výsledek na webu
<a href="http://dx.doi.org/10.1016/j.cattod.2013.11.024" target="_blank" >http://dx.doi.org/10.1016/j.cattod.2013.11.024</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.cattod.2013.11.024" target="_blank" >10.1016/j.cattod.2013.11.024</a>
Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
ZnO thin films prepared by surfatron produced discharge
Popis výsledku v původním jazyce
Multi plasma jet system with 4 independent nozzles working on the principle of surface-wave discharge (SWD) has been developed. The system was optimized and used for plasma-enhanced chemical vapor deposition (PECVD) of nominally pure and Al and Mn dopedZnO thin films. The surfatron source was powered by a microwave magnetron generator working at a frequency of 2.45 GHz with the output power of 300 W per surfatron. The time-resolved properties of low-pressure plasma jet working under deposition conditions in pulse mode were studied using Langmuir probe. It was found that the plasma density inside the active plasma jet is about 1017 m-3 and electron effective temperature can reach approximately 3 eV. The set of ZnO samples with a thickness of 300 nm were prepared on Si, ITO and quartz substrate and were analyzed by XRD, SEM, EDX, UV-light amperometry and optical ellipsometry. All samples under study were crystalline in nature, revealed n-type conductivity.
Název v anglickém jazyce
ZnO thin films prepared by surfatron produced discharge
Popis výsledku anglicky
Multi plasma jet system with 4 independent nozzles working on the principle of surface-wave discharge (SWD) has been developed. The system was optimized and used for plasma-enhanced chemical vapor deposition (PECVD) of nominally pure and Al and Mn dopedZnO thin films. The surfatron source was powered by a microwave magnetron generator working at a frequency of 2.45 GHz with the output power of 300 W per surfatron. The time-resolved properties of low-pressure plasma jet working under deposition conditions in pulse mode were studied using Langmuir probe. It was found that the plasma density inside the active plasma jet is about 1017 m-3 and electron effective temperature can reach approximately 3 eV. The set of ZnO samples with a thickness of 300 nm were prepared on Si, ITO and quartz substrate and were analyzed by XRD, SEM, EDX, UV-light amperometry and optical ellipsometry. All samples under study were crystalline in nature, revealed n-type conductivity.
Klasifikace
Druh
J<sub>x</sub> - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
CEP obor
BL - Fyzika plasmatu a výboje v plynech
OECD FORD obor
—
Návaznosti výsledku
Projekt
Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.
Návaznosti
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Ostatní
Rok uplatnění
2014
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Údaje specifické pro druh výsledku
Název periodika
Catalysis Today
ISSN
0920-5861
e-ISSN
—
Svazek periodika
230
Číslo periodika v rámci svazku
Jul
Stát vydavatele periodika
NL - Nizozemsko
Počet stran výsledku
6
Strana od-do
119-124
Kód UT WoS článku
000333800300020
EID výsledku v databázi Scopus
—