Synthesis of Si-NWs by PECVD using Sn as catalyst on TCO thin film for optoelectronic devicies
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F14%3A00511234" target="_blank" >RIV/68378271:_____/14:00511234 - isvavai.cz</a>
Výsledek na webu
<a href="http://hdl.handle.net/11104/0301556" target="_blank" >http://hdl.handle.net/11104/0301556</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/2043-6262/5/4/045011" target="_blank" >10.1088/2043-6262/5/4/045011</a>
Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Synthesis of Si-NWs by PECVD using Sn as catalyst on TCO thin film for optoelectronic devicies
Popis výsledku v původním jazyce
In this paper we focus on silicon nanowires (Si-NWs) which were fabricated on transparent conductive substrates (TCO) by plasma-enhanced chemical vapor deposition (PECVD) method using Sn as stimulated catalyst metal. TCO which we used are ZnO fabricated by direct current (dc) sputtering. Property of ZnO thin film was investigated by x-ray diffraction (XRD), volt-ohm-miliampere (VOM) meter, and Stylus method. In order to grow Si-NWs using PECVD we need to use Sn as catalyst to synthesize Si-NWs. Sn nanoparticles were fabricated by high vacuum evaporation system with SenVac thin film controller. Size and density of nanoparticles (NPs) were investigated by scanning electron microscope (SEM). The influence of the thickness and forming Sn NPs was studied. In particular, the factors affecting the formation of Si-NWs such as temperature and rate of gas were examined. Si-NWs' properties were investigated by SEM, Raman spectroscopy and energy dispersive x-ray (EDX) spectrocopyn
Název v anglickém jazyce
Synthesis of Si-NWs by PECVD using Sn as catalyst on TCO thin film for optoelectronic devicies
Popis výsledku anglicky
In this paper we focus on silicon nanowires (Si-NWs) which were fabricated on transparent conductive substrates (TCO) by plasma-enhanced chemical vapor deposition (PECVD) method using Sn as stimulated catalyst metal. TCO which we used are ZnO fabricated by direct current (dc) sputtering. Property of ZnO thin film was investigated by x-ray diffraction (XRD), volt-ohm-miliampere (VOM) meter, and Stylus method. In order to grow Si-NWs using PECVD we need to use Sn as catalyst to synthesize Si-NWs. Sn nanoparticles were fabricated by high vacuum evaporation system with SenVac thin film controller. Size and density of nanoparticles (NPs) were investigated by scanning electron microscope (SEM). The influence of the thickness and forming Sn NPs was studied. In particular, the factors affecting the formation of Si-NWs such as temperature and rate of gas were examined. Si-NWs' properties were investigated by SEM, Raman spectroscopy and energy dispersive x-ray (EDX) spectrocopyn
Klasifikace
Druh
J<sub>imp</sub> - Článek v periodiku v databázi Web of Science
CEP obor
—
OECD FORD obor
10302 - Condensed matter physics (including formerly solid state physics, supercond.)
Návaznosti výsledku
Projekt
Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.
Návaznosti
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Ostatní
Rok uplatnění
2014
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Údaje specifické pro druh výsledku
Název periodika
Advances in Natural Sciences-Nanoscience and Nanotechnology
ISSN
2043-6254
e-ISSN
—
Svazek periodika
5
Číslo periodika v rámci svazku
4
Stát vydavatele periodika
GB - Spojené království Velké Británie a Severního Irska
Počet stran výsledku
8
Strana od-do
1-8
Kód UT WoS článku
000365744600013
EID výsledku v databázi Scopus
2-s2.0-84916919386