The metallic nanoparticles integrated into thin layers of hydrogenated amorphous silicon
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F19%3A00522068" target="_blank" >RIV/68378271:_____/19:00522068 - isvavai.cz</a>
Výsledek na webu
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DOI - Digital Object Identifier
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Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
The metallic nanoparticles integrated into thin layers of hydrogenated amorphous silicon
Popis výsledku v původním jazyce
The metallic nanoparticles integrated into thin semiconductor layer to increase the optical absorption below the optical absorption edge in the near infrared region are expected to significantly degrade the electronic quality of the semiconductor due to the recombination centers introduced in the energy band gap. Contrary to these expectations, our new measurements on PIN structures indicates only meager impact of embedded NPs on the current - voltage characteristics. Here we present our novel PIN structures based on a-Si:H thin films with embedded Sn NPs characterized by electron microscopy (SEM and HRTEM), atomic force microscopy (AFM), photothermal deflection spectroscopy (PDS), constant photocurrent method (CPM), photoluminescence (PL) and electroluminescence (EL). The temperature dependence of the electrical conductivity and the changes of its activation energy are discussed in the frame of the theoretical model of the transfer of the charge carriers in these structures.n
Název v anglickém jazyce
The metallic nanoparticles integrated into thin layers of hydrogenated amorphous silicon
Popis výsledku anglicky
The metallic nanoparticles integrated into thin semiconductor layer to increase the optical absorption below the optical absorption edge in the near infrared region are expected to significantly degrade the electronic quality of the semiconductor due to the recombination centers introduced in the energy band gap. Contrary to these expectations, our new measurements on PIN structures indicates only meager impact of embedded NPs on the current - voltage characteristics. Here we present our novel PIN structures based on a-Si:H thin films with embedded Sn NPs characterized by electron microscopy (SEM and HRTEM), atomic force microscopy (AFM), photothermal deflection spectroscopy (PDS), constant photocurrent method (CPM), photoluminescence (PL) and electroluminescence (EL). The temperature dependence of the electrical conductivity and the changes of its activation energy are discussed in the frame of the theoretical model of the transfer of the charge carriers in these structures.n
Klasifikace
Druh
O - Ostatní výsledky
CEP obor
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OECD FORD obor
10302 - Condensed matter physics (including formerly solid state physics, supercond.)
Návaznosti výsledku
Projekt
Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.
Návaznosti
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Ostatní
Rok uplatnění
2019
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů