Intensity distribution modulation of multiple beam interference pattern

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F19%3A00567486" target="_blank" >RIV/68378271:_____/19:00567486 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68407700:21340/19:00340453

Výsledek na webu

<a href="https://hdl.handle.net/11104/0338735" target="_blank" >https://hdl.handle.net/11104/0338735</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.17973/MMSJ.2019_12_2019117" target="_blank" >10.17973/MMSJ.2019_12_2019117</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Intensity distribution modulation of multiple beam interference pattern

Popis výsledku v původním jazyce

Nanostructuring and microstructuring approaches frequently used in microelectronics manufacturing, such as electron beam lithography or nanoimprint lithography,are considerably slow.In order to reduce processing time,laser patterning methods based on interference of multiple beams have been developed.Within one laser pulse,a significant part of an irradiated area on a sample surface is patterned with desired micro- or sub-microstructures.Interference patterning goes beyond periodic lines and dots.Controlling the number of interfering beams,orientation of polarization vectors,relative phase shift,the beam angle of incidence allows to customize the intensity distribution on the sample surface.Simulations of various interference patterns were verified on CMOS camera using 1030nm laser diode.Based on these results,dot and line-like interference patterns were directly imprinted on the surface of carbon fiber reinforced polyether ether ketone plate by 1.8ps,11mJ las. pulses at 1030nm.

Název v anglickém jazyce

Intensity distribution modulation of multiple beam interference pattern

Popis výsledku anglicky

Nanostructuring and microstructuring approaches frequently used in microelectronics manufacturing, such as electron beam lithography or nanoimprint lithography,are considerably slow.In order to reduce processing time,laser patterning methods based on interference of multiple beams have been developed.Within one laser pulse,a significant part of an irradiated area on a sample surface is patterned with desired micro- or sub-microstructures.Interference patterning goes beyond periodic lines and dots.Controlling the number of interfering beams,orientation of polarization vectors,relative phase shift,the beam angle of incidence allows to customize the intensity distribution on the sample surface.Simulations of various interference patterns were verified on CMOS camera using 1030nm laser diode.Based on these results,dot and line-like interference patterns were directly imprinted on the surface of carbon fiber reinforced polyether ether ketone plate by 1.8ps,11mJ las. pulses at 1030nm.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10306 - Optics (including laser optics and quantum optics)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2019

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

MM Science Journal

ISSN

1803-1269

e-ISSN

—

Svazek periodika

2019

Číslo periodika v rámci svazku

Dec

Stát vydavatele periodika

CZ - Česká republika

Počet stran výsledku

5

Strana od-do

3652-3656

Kód UT WoS článku

000532572200043

EID výsledku v databázi Scopus

2-s2.0-85076599510