Flexible method based on four-beam interference lithography for fabrication of large areas of perfectly periodic plasmonic arrays

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F67985882%3A_____%2F14%3A00436364" target="_blank" >RIV/67985882:_____/14:00436364 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1364/OE.22.018778" target="_blank" >http://dx.doi.org/10.1364/OE.22.018778</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1364/OE.22.018778" target="_blank" >10.1364/OE.22.018778</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Flexible method based on four-beam interference lithography for fabrication of large areas of perfectly periodic plasmonic arrays

Popis výsledku v původním jazyce

A novel nanofabrication technique based on 4-beam interference lithography is presented that enables the preparation of large macroscopic areas (>50 mm2) of perfectly periodic and defect-free two-dimensional plasmonic arrays of nanoparticles as small as100 nm. The technique is based on a special interferometer, composed of two mirrors and a sample with photoresist that together form a right-angled corner reflector. In such an interferometer, the incoming expanded laser beam is split into four interfering beams that yield an interference pattern with rectangular symmetry. The interferometer allows setting the periods of the array from about 220 nm to 1500 nm in both directions independently through the rotation of the corner-reflector assembly around horizontal and vertical axes perpendicular to the direction of the incident beam. Using a theoretical model, the implementation of the four-beam interference lithography is discussed in terms of the optimum contrast as well as attainable p

Název v anglickém jazyce

Flexible method based on four-beam interference lithography for fabrication of large areas of perfectly periodic plasmonic arrays

Popis výsledku anglicky

A novel nanofabrication technique based on 4-beam interference lithography is presented that enables the preparation of large macroscopic areas (>50 mm2) of perfectly periodic and defect-free two-dimensional plasmonic arrays of nanoparticles as small as100 nm. The technique is based on a special interferometer, composed of two mirrors and a sample with photoresist that together form a right-angled corner reflector. In such an interferometer, the incoming expanded laser beam is split into four interfering beams that yield an interference pattern with rectangular symmetry. The interferometer allows setting the periods of the array from about 220 nm to 1500 nm in both directions independently through the rotation of the corner-reflector assembly around horizontal and vertical axes perpendicular to the direction of the incident beam. Using a theoretical model, the implementation of the four-beam interference lithography is discussed in terms of the optimum contrast as well as attainable p

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

JA - Elektronika a optoelektronika, elektrotechnika

OECD FORD obor

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Projekt

<a href="/cs/project/GBP205%2F12%2FG118" target="_blank" >GBP205/12/G118: Nanobiofotonika pro medicínu budoucnosti</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Optics Express

ISSN

1094-4087

e-ISSN

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Svazek periodika

22

Číslo periodika v rámci svazku

15

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

12

Strana od-do

18778-18789

Kód UT WoS článku

000340685600116

EID výsledku v databázi Scopus

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