INTENSITY DISTRIBUTION MODULATION OF MULTIPLE BEAM INTERFERENCE PATTERN

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21340%2F19%3A00340453" target="_blank" >RIV/68407700:21340/19:00340453 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68378271:_____/19:00567486

Výsledek na webu

<a href="https://doi.org/10.17973/MMSJ.2019_12_2019017" target="_blank" >https://doi.org/10.17973/MMSJ.2019_12_2019017</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.17973/MMSJ.2019_12_2019017" target="_blank" >10.17973/MMSJ.2019_12_2019017</a>

Jazyk výsledku

angličtina

Název v původním jazyce

INTENSITY DISTRIBUTION MODULATION OF MULTIPLE BEAM INTERFERENCE PATTERN

Popis výsledku v původním jazyce

Nanostructuring and microstructuring approaches frequently used in microelectronics manufacturing, such as electron beam lithography or nanoimprint lithography, are considerably slow. In order to reduce processing time, laser patterning methods based on interference of multiple beams have been developed. Within one laser pulse, a significant part of an irradiated area on a sample surface is patterned with desired micro- or sub-microstructures. Nowadays, interference patterning goes beyond periodic lines and dots. Controlling the number of interfering beams, orientation of polarization vectors, relative phase shift, and the beam angle of incidence allows to customize the intensity distribution on the sample surface. Simulations of various interference patterns were calculated and verified on CMOS camera using 1030 nm laser diode. Based on these results, dot and line-like interference patterns were directly imprinted on the surface of carbon fiber reinforced polyether ether ketone plate by 1.8 ps, 11 mJ laser pulses at 1030 nm.

Název v anglickém jazyce

INTENSITY DISTRIBUTION MODULATION OF MULTIPLE BEAM INTERFERENCE PATTERN

Popis výsledku anglicky

Nanostructuring and microstructuring approaches frequently used in microelectronics manufacturing, such as electron beam lithography or nanoimprint lithography, are considerably slow. In order to reduce processing time, laser patterning methods based on interference of multiple beams have been developed. Within one laser pulse, a significant part of an irradiated area on a sample surface is patterned with desired micro- or sub-microstructures. Nowadays, interference patterning goes beyond periodic lines and dots. Controlling the number of interfering beams, orientation of polarization vectors, relative phase shift, and the beam angle of incidence allows to customize the intensity distribution on the sample surface. Simulations of various interference patterns were calculated and verified on CMOS camera using 1030 nm laser diode. Based on these results, dot and line-like interference patterns were directly imprinted on the surface of carbon fiber reinforced polyether ether ketone plate by 1.8 ps, 11 mJ laser pulses at 1030 nm.

Druh

J_SC - Článek v periodiku v databázi SCOPUS

CEP obor

—

OECD FORD obor

10306 - Optics (including laser optics and quantum optics)

Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2019

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

MM Science Journal

ISSN

1803-1269

e-ISSN

1805-0476

Svazek periodika

—

Číslo periodika v rámci svazku

12

Stát vydavatele periodika

CZ - Česká republika

Počet stran výsledku

5

Strana od-do

3652-3656

Kód UT WoS článku

—

EID výsledku v databázi Scopus

2-s2.0-85076599510