Deposition of cobalt oxide films by reactive pulsed magnetron sputtering

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F21%3A00541687" target="_blank" >RIV/68378271:_____/21:00541687 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/61989100:27740/21:10247411

Výsledek na webu

<a href="https://doi.org/10.1016/j.surfcoat.2020.126590" target="_blank" >https://doi.org/10.1016/j.surfcoat.2020.126590</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2020.126590" target="_blank" >10.1016/j.surfcoat.2020.126590</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Deposition of cobalt oxide films by reactive pulsed magnetron sputtering

Popis výsledku v původním jazyce

Cobalt oxide films were deposited with the help of reactive HiPIMS and mid-frequency pulsed magnetron sputtering (PMS) in argon gas at an argon gas pressure of 1 Pa and with different oxygen admixtures. The intensity of plasma ions, in particular Co+ and O+, is enhanced during HiPIMS compared to PMS and extends to larger ion energies. Films deposited on glass substrates were characterized by scanning electron microscopy, X-ray photoelectron spectroscopy, Raman spectroscopy, and X-ray diffraction. Crystal structure and electrical resistivity of as-deposited films were found to depend on the deposition conditions. Deposited films are compatible with a non-stoichiometric Co3O4 spinel type crystal structure with unoccupied cobalt sites. PMS produces films with a preferred lattice orientation. HiPIMS show large internal stress which relaxes during annealing. Electrical resistivity is several orders of magnitude smaller for films deposited by HiPIMS compared to PMS.

Název v anglickém jazyce

Deposition of cobalt oxide films by reactive pulsed magnetron sputtering

Popis výsledku anglicky

Cobalt oxide films were deposited with the help of reactive HiPIMS and mid-frequency pulsed magnetron sputtering (PMS) in argon gas at an argon gas pressure of 1 Pa and with different oxygen admixtures. The intensity of plasma ions, in particular Co+ and O+, is enhanced during HiPIMS compared to PMS and extends to larger ion energies. Films deposited on glass substrates were characterized by scanning electron microscopy, X-ray photoelectron spectroscopy, Raman spectroscopy, and X-ray diffraction. Crystal structure and electrical resistivity of as-deposited films were found to depend on the deposition conditions. Deposited films are compatible with a non-stoichiometric Co3O4 spinel type crystal structure with unoccupied cobalt sites. PMS produces films with a preferred lattice orientation. HiPIMS show large internal stress which relaxes during annealing. Electrical resistivity is several orders of magnitude smaller for films deposited by HiPIMS compared to PMS.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

—

Svazek periodika

405

Číslo periodika v rámci svazku

Jan

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

11

Strana od-do

126590

Kód UT WoS článku

000604583200062

EID výsledku v databázi Scopus

2-s2.0-85096441240