Copper tungsten oxide (CuxWOy) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F22%3A00566773" target="_blank" >RIV/68378271:_____/22:00566773 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/61989592:15310/22:73617290

Výsledek na webu

<a href="https://hdl.handle.net/11104/0338068" target="_blank" >https://hdl.handle.net/11104/0338068</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1063/5.0123075" target="_blank" >10.1063/5.0123075</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Copper tungsten oxide (CuxWOy) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering

Popis výsledku v původním jazyce

Copper tungsten oxide films are deposited with the help of reactive high power impulse magnetron sputtering (HiPIMS) in an argon/oxygen gas mixture. Two magnetrons, one equipped with a tungsten target and the other with a copper target, are employed. The HiPIMS discharge is operated with a repetition frequency of f ¼ 100 Hz. Pulse widths of 100 and 20 μs separated by 25 μs are chosen for the tungsten and copper target, respectively. Films deposited on two different glass substrates [soda lime glass and fluorine doped tin oxide (FTO) coated glass] are characterized by energy dispersive x-ray spectroscopy, x-ray photoelectron spectroscopy, x-ray diffraction, Raman spectroscopy, and ellipsometry. Photoelectrochemical activity was investigated by linear voltammetry. Annealed films deposited on FTO glass are composed of WO3 and CuWO4 or Cu2WO4 crystal phases.

Název v anglickém jazyce

Copper tungsten oxide (CuxWOy) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering

Popis výsledku anglicky

Copper tungsten oxide films are deposited with the help of reactive high power impulse magnetron sputtering (HiPIMS) in an argon/oxygen gas mixture. Two magnetrons, one equipped with a tungsten target and the other with a copper target, are employed. The HiPIMS discharge is operated with a repetition frequency of f ¼ 100 Hz. Pulse widths of 100 and 20 μs separated by 25 μs are chosen for the tungsten and copper target, respectively. Films deposited on two different glass substrates [soda lime glass and fluorine doped tin oxide (FTO) coated glass] are characterized by energy dispersive x-ray spectroscopy, x-ray photoelectron spectroscopy, x-ray diffraction, Raman spectroscopy, and ellipsometry. Photoelectrochemical activity was investigated by linear voltammetry. Annealed films deposited on FTO glass are composed of WO3 and CuWO4 or Cu2WO4 crystal phases.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2022

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Applied Physics

ISSN

0021-8979

e-ISSN

1089-7550

Svazek periodika

132

Číslo periodika v rámci svazku

21

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

13

Strana od-do

215301

Kód UT WoS článku

000894517100001

EID výsledku v databázi Scopus

2-s2.0-85144137293