Large negative photoresistivity in amorphous NdNiO3 film

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F21%3A00552096" target="_blank" >RIV/68378271:_____/21:00552096 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68407700:21340/21:00353841

Výsledek na webu

<a href="http://hdl.handle.net/11104/0327249" target="_blank" >http://hdl.handle.net/11104/0327249</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.3390/coatings11111411" target="_blank" >10.3390/coatings11111411</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Large negative photoresistivity in amorphous NdNiO3 film

Popis výsledku v původním jazyce

A significant decrease in resistivity by 55% under blue lighting with ~0.4 Jmm-2 energy density is demonstrated in amorphous film of metal-insulator NdNiO3 at room temperature. This large negative photoresistivity contrasts with a small positive photoresistivity of 8% in epitaxial NdNiO3 film under the same illumination conditions. The magnitude of the photoresistivity rises with the increasing power density or decreasing wavelength of light. By combining the analysis of the observed photoresistive effect with optical absorption and the resistivity of the films as a function of temperature, it is shown that photo-stimulated heating determines the photoresistivity in both types of films. Because amorphous films can be easily grown on a wide range of substrates, the demonstrated large photo(thermo)resistivity in such films is attractive for potential applications, e.g., thermal photodetectors and thermistors.

Název v anglickém jazyce

Large negative photoresistivity in amorphous NdNiO3 film

Popis výsledku anglicky

A significant decrease in resistivity by 55% under blue lighting with ~0.4 Jmm-2 energy density is demonstrated in amorphous film of metal-insulator NdNiO3 at room temperature. This large negative photoresistivity contrasts with a small positive photoresistivity of 8% in epitaxial NdNiO3 film under the same illumination conditions. The magnitude of the photoresistivity rises with the increasing power density or decreasing wavelength of light. By combining the analysis of the observed photoresistive effect with optical absorption and the resistivity of the films as a function of temperature, it is shown that photo-stimulated heating determines the photoresistivity in both types of films. Because amorphous films can be easily grown on a wide range of substrates, the demonstrated large photo(thermo)resistivity in such films is attractive for potential applications, e.g., thermal photodetectors and thermistors.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/GA20-21864S" target="_blank" >GA20-21864S: Výzkum tenkých vrstev a vícevrstvých struktur niklanů pro vývoj nových elektrooptických systémů</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Coatings

ISSN

2079-6412

e-ISSN

2079-6412

Svazek periodika

11

Číslo periodika v rámci svazku

11

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

13

Strana od-do

1411

Kód UT WoS článku

000726658000001

EID výsledku v databázi Scopus

2-s2.0-85122816190