High deposition rate films prepared by reactive HiPIMS

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F21%3A00567523" target="_blank" >RIV/68378271:_____/21:00567523 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/45309787:_____/21:N0000001 RIV/49777513:23520/21:43962009

Výsledek na webu

<a href="https://doi.org/10.1016/j.vacuum.2021.110329" target="_blank" >https://doi.org/10.1016/j.vacuum.2021.110329</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.vacuum.2021.110329" target="_blank" >10.1016/j.vacuum.2021.110329</a>

Jazyk výsledku

angličtina

Název v původním jazyce

High deposition rate films prepared by reactive HiPIMS

Popis výsledku v původním jazyce

High power impulse magnetron sputtering (HiPIMS) is characterized by a very high current density at the target during each pulse. A large fraction of sputtered target material is ionized, which allows the preparation of hard and defect-free coatings. Compared to the conventional sputtering methods, HiPIMS technology possesses a certain drawback, i.e. lower deposition rate. A promising variation, i.e. reactive HiPIMS, was described by a mathematical model (S. Kadlec et al. JAP 121 (2017) 171910). One of the fundamental results shows that reactive HiPIMS can deliver higher deposition rates compared to the mid-frequency pulsed dc magnetron sputtering (Mf-PCDMS) due to a lower degree of target poisoning. To confirm these theoretical results, series of experiments were performed in laboratory deposition system with different target materials (Al, Cr, Ti, Zr, Hf, Ta, Nb). We supported our experimental results by Monte-Carlo simulations performed in SRIM and SDTrimSP simulation software.

Název v anglickém jazyce

High deposition rate films prepared by reactive HiPIMS

Popis výsledku anglicky

High power impulse magnetron sputtering (HiPIMS) is characterized by a very high current density at the target during each pulse. A large fraction of sputtered target material is ionized, which allows the preparation of hard and defect-free coatings. Compared to the conventional sputtering methods, HiPIMS technology possesses a certain drawback, i.e. lower deposition rate. A promising variation, i.e. reactive HiPIMS, was described by a mathematical model (S. Kadlec et al. JAP 121 (2017) 171910). One of the fundamental results shows that reactive HiPIMS can deliver higher deposition rates compared to the mid-frequency pulsed dc magnetron sputtering (Mf-PCDMS) due to a lower degree of target poisoning. To confirm these theoretical results, series of experiments were performed in laboratory deposition system with different target materials (Al, Cr, Ti, Zr, Hf, Ta, Nb). We supported our experimental results by Monte-Carlo simulations performed in SRIM and SDTrimSP simulation software.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Vacuum

ISSN

0042-207X

e-ISSN

1879-2715

Svazek periodika

191

Číslo periodika v rámci svazku

Sep

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

10

Strana od-do

110329

Kód UT WoS článku

000679319300003

EID výsledku v databázi Scopus

2-s2.0-85107435174