High deposition rate films prepared by reactive HiPIMS

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F21%3A43962009" target="_blank" >RIV/49777513:23520/21:43962009 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/45309787:_____/21:N0000001 RIV/68378271:_____/21:00567523

Výsledek na webu

<a href="https://doi.org/10.1016/j.vacuum.2021.110329" target="_blank" >https://doi.org/10.1016/j.vacuum.2021.110329</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.vacuum.2021.110329" target="_blank" >10.1016/j.vacuum.2021.110329</a>

Jazyk výsledku

angličtina

Název v původním jazyce

High deposition rate films prepared by reactive HiPIMS

Popis výsledku v původním jazyce

Theoretical models indicate that reactive HiPIMS can deliver higher deposition rates compared to the mid-frequency pulsed dc magnetron sputtering (Mf-PDCMS) due to a lower degree of target poisoning. To confirm these theoretical results, series of experiments were performed in laboratory deposition system with different target materials (Al, Cr, Ti, Zr, Hf, Ta, Nb). Two targets of the same material were employed both in dual Mf-PDCMS and in dual HiPIMS conditions at a fixed power. It is confirmed that higher values of the deposition rate for Ta2O5 and Nb2O5 films can be achieved by HiPIMS when operated in the poisoned regime. The experimental results are supported by Monte-Carlo simulations performed in SRIM and SDTrimSP simulation software.

Název v anglickém jazyce

High deposition rate films prepared by reactive HiPIMS

Popis výsledku anglicky

Theoretical models indicate that reactive HiPIMS can deliver higher deposition rates compared to the mid-frequency pulsed dc magnetron sputtering (Mf-PDCMS) due to a lower degree of target poisoning. To confirm these theoretical results, series of experiments were performed in laboratory deposition system with different target materials (Al, Cr, Ti, Zr, Hf, Ta, Nb). Two targets of the same material were employed both in dual Mf-PDCMS and in dual HiPIMS conditions at a fixed power. It is confirmed that higher values of the deposition rate for Ta2O5 and Nb2O5 films can be achieved by HiPIMS when operated in the poisoned regime. The experimental results are supported by Monte-Carlo simulations performed in SRIM and SDTrimSP simulation software.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Vacuum

ISSN

0042-207X

e-ISSN

—

Svazek periodika

191

Číslo periodika v rámci svazku

SEP 2021

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

10

Strana od-do

"110329-1"-"110329-10"

Kód UT WoS článku

000679319300003

EID výsledku v databázi Scopus

2-s2.0-85107435174